Used TEL / TOKYO ELECTRON Unity IIe #9093721 for sale

TEL / TOKYO ELECTRON Unity IIe
ID: 9093721
Wafer Size: 8"
Vintage: 1998
Dry etcher, 8" Configuration: Unity 2 DRM Chamber type: DRM Software version: Ver 3.61-Rev 212 Wafer type: Flat Main body type: Wide Chamber: 2-Chamber Robot type: Yaskawa/Twin arm Robot drive: Yaskawa/VS2A Robot drive: Yaskawa/Vosh Pendulum valve: VAT/65046-PH52 Isolations V/V: Present Pressure gauge: MKS/627A-13614-S TMP1: Seiko Seiki/STP-1303W1 TMP2: Seiko Seiki/STP-1303W1 TMP Con't1: Seiko Seiki/STP-1303W1 TEMP Con't2: Seiko Seiki/STP-1303W1 Generator1: ENI/OEM-25B-01 Generator2: ENI/OEM-25B-01 Matcher1: ENI/MWD-25LD Matcher2: ENI/MWD-25LD Chiller1: SMC INR499-201 Gas: 8-Line STEC/Aera B.HE (CNT): STEC/SEC-7440 B.HE (Edge): STEC/SEC-7440 Main controller: ISA SLOT1 NE2000 PLUS3N-2 Present ISA SLOT2 IBX4101 Present ISA SLOT3 EMPTY Present ISA SLOT4 AT-BCN/A Present HDD(SYSTEM) Present HDD(DATA) Present VME slot 1 SVA 004a Present VME slot 2 SVA603 Present VME slot 3 MVME612 Present VME slot 4 GST-M-SET-312 Present VME slot 5 TVB0002 Present VME slot 6 TVB0010-1 Present VME slot 7 TEB102-1 Present VME slot 8 EMPTY VME slot 9 TVB0008 Present VME slot 10 TEB3101-1 Present TYB221-1/PUMP Present TYB415-1/RF Present TYB212-1/RF Present TYB416-1/PUMP Present TYB414-1/CONT Present TYB425-1/INT Present P/C1 Controller: Slot 1 APC(PB-2) Present Slot 2 TYB112-1/DIO Present Slot 3 TYB111/MAIO Present Slot 4 TYB121/COM Present Slot 5 TYB121/COM Present Slot 6 TEMP Present Slot 7 EMPTY P/C2 Controller: Slot 1 APC(PB-2) Present Slot 2 TYB112-1/DIO Present Slot 3 TYB111/MAIO Present Slot 4 TYB121/COM Present Slot 5 TYB121/COM Present Slot 6 TEMP Present Slot 7 EMPTY T/C Controller: Slot 1 COM Present Slot 2 TYB112-1/DIO1 Present Slot 3 TYB112-1/DIO2 Present Slot 4 TYB112-1/DIO3 Present Slot 5 MAIO Present Slot 6 TYB131-1/ILK Present Gas Box module: TYB 211-A/GAS(1) Present TYB 211-A/GAS(2) Present 1998 vintage.
TEL / TOKYO ELECTRON Unity IIe etcher/asher is a reliable, cost-effective, and highly efficient etching and ashing process that is ideal for device-level processing, yield management, and product innovation. TEL Unity IIe is one of TEL advanced plasma etchers and ashers which are designed to deliver extremely precise processing. The process chamber is rated for class 10,000 cleanliness and equipped with advanced process control features such as automatic gas switching and auto-balanced power distribution to ensure superior etching and ashing performance. TOKYO ELECTRON Unity IIe uses a low-pressure plasma etching process that is ideal for creating high-aspect ratio features. It employs a PECVD overcoat that creates an exact conformal coating for enhanced etching and ashing precision. For improved process economics, Unity IIe is capable of processing large wafers in single runs. It uses an 8x300mm wafer size and is temperature programmable for superior substrate adhesion. TEL / TOKYO ELECTRON Unity IIe also comes with multi-station wafer cassette loading, auto-purge fail-safe protection, and intuitive automated wafer loading technology to ensure excellent wafer handling and throughput. TEL Unity IIe also has configurable process gas lines that can be used for etching, ashing, or a combination of both processes. It has five independent gas delivery systems that enable optimized etching profiles for optimal etch results. In addition, TOKYO ELECTRON Unity IIe is equipped with customizable process recipes, adjustable parameters, and advanced online feedback control for superior etching precision. Unity IIe is designed for use in various industries, such as semiconductor, consumer electronics, MEMS, and LED fabrication. With its powerful etching and ashing capabilities, TEL / TOKYO ELECTRON Unity IIe can rapidly process 260-300 wafers per hour while achieving superior uniformity. It is capable of fully controlling process parameters to ensure repeatable and consistent results for increased product reliability and yield.
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