Used TEL / TOKYO ELECTRON Unity IIe #9093721 for sale
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ID: 9093721
Wafer Size: 8"
Vintage: 1998
Dry etcher, 8"
Configuration: Unity 2 DRM
Chamber type: DRM
Software version: Ver 3.61-Rev 212
Wafer type: Flat
Main body type: Wide
Chamber: 2-Chamber
Robot type: Yaskawa/Twin arm
Robot drive: Yaskawa/VS2A
Robot drive: Yaskawa/Vosh
Pendulum valve: VAT/65046-PH52
Isolations V/V: Present
Pressure gauge: MKS/627A-13614-S
TMP1: Seiko Seiki/STP-1303W1
TMP2: Seiko Seiki/STP-1303W1
TMP Con't1: Seiko Seiki/STP-1303W1
TEMP Con't2: Seiko Seiki/STP-1303W1
Generator1: ENI/OEM-25B-01
Generator2: ENI/OEM-25B-01
Matcher1: ENI/MWD-25LD
Matcher2: ENI/MWD-25LD
Chiller1: SMC INR499-201
Gas: 8-Line STEC/Aera
B.HE (CNT): STEC/SEC-7440
B.HE (Edge): STEC/SEC-7440
Main controller:
ISA SLOT1 NE2000 PLUS3N-2 Present
ISA SLOT2 IBX4101 Present
ISA SLOT3 EMPTY Present
ISA SLOT4 AT-BCN/A Present
HDD(SYSTEM) Present
HDD(DATA) Present
VME slot 1 SVA 004a Present
VME slot 2 SVA603 Present
VME slot 3 MVME612 Present
VME slot 4 GST-M-SET-312 Present
VME slot 5 TVB0002 Present
VME slot 6 TVB0010-1 Present
VME slot 7 TEB102-1 Present
VME slot 8 EMPTY
VME slot 9 TVB0008 Present
VME slot 10 TEB3101-1 Present
TYB221-1/PUMP Present
TYB415-1/RF Present
TYB212-1/RF Present
TYB416-1/PUMP Present
TYB414-1/CONT Present
TYB425-1/INT Present
P/C1 Controller:
Slot 1 APC(PB-2) Present
Slot 2 TYB112-1/DIO Present
Slot 3 TYB111/MAIO Present
Slot 4 TYB121/COM Present
Slot 5 TYB121/COM Present
Slot 6 TEMP Present
Slot 7 EMPTY
P/C2 Controller:
Slot 1 APC(PB-2) Present
Slot 2 TYB112-1/DIO Present
Slot 3 TYB111/MAIO Present
Slot 4 TYB121/COM Present
Slot 5 TYB121/COM Present
Slot 6 TEMP Present
Slot 7 EMPTY
T/C Controller:
Slot 1 COM Present
Slot 2 TYB112-1/DIO1 Present
Slot 3 TYB112-1/DIO2 Present
Slot 4 TYB112-1/DIO3 Present
Slot 5 MAIO Present
Slot 6 TYB131-1/ILK Present
Gas Box module:
TYB 211-A/GAS(1) Present
TYB 211-A/GAS(2) Present
1998 vintage.
TEL / TOKYO ELECTRON Unity IIe etcher/asher is a reliable, cost-effective, and highly efficient etching and ashing process that is ideal for device-level processing, yield management, and product innovation. TEL Unity IIe is one of TEL advanced plasma etchers and ashers which are designed to deliver extremely precise processing. The process chamber is rated for class 10,000 cleanliness and equipped with advanced process control features such as automatic gas switching and auto-balanced power distribution to ensure superior etching and ashing performance. TOKYO ELECTRON Unity IIe uses a low-pressure plasma etching process that is ideal for creating high-aspect ratio features. It employs a PECVD overcoat that creates an exact conformal coating for enhanced etching and ashing precision. For improved process economics, Unity IIe is capable of processing large wafers in single runs. It uses an 8x300mm wafer size and is temperature programmable for superior substrate adhesion. TEL / TOKYO ELECTRON Unity IIe also comes with multi-station wafer cassette loading, auto-purge fail-safe protection, and intuitive automated wafer loading technology to ensure excellent wafer handling and throughput. TEL Unity IIe also has configurable process gas lines that can be used for etching, ashing, or a combination of both processes. It has five independent gas delivery systems that enable optimized etching profiles for optimal etch results. In addition, TOKYO ELECTRON Unity IIe is equipped with customizable process recipes, adjustable parameters, and advanced online feedback control for superior etching precision. Unity IIe is designed for use in various industries, such as semiconductor, consumer electronics, MEMS, and LED fabrication. With its powerful etching and ashing capabilities, TEL / TOKYO ELECTRON Unity IIe can rapidly process 260-300 wafers per hour while achieving superior uniformity. It is capable of fully controlling process parameters to ensure repeatable and consistent results for increased product reliability and yield.
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