Used TEL / TOKYO ELECTRON Unity ME 8555 SSS #9026935 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9026935
Vintage: 2001
Oxide etcher, 8"
CASS nest: plastic 8"
Wafer shape: SNNF (Semi Notch No Flat)
SMIF interface: no
Platform type: Unitiy ME
Through the wall: yes
Software version: Ver2.35-Rev405-GEM-5.57a
SECS / GEM GEM / HSMS
Transfer module:
Cassette chamber: 2
Transfer chamber: 1
ECC controller / TC controller: 1
P/A (alignment unit): 1
Transfer robot: 1
Process chamber module:
Process chamber qty: 3
Gas box: 3
PC controller: 3
System monitor display: 2 (front, rear)
SEMI S2-0200: yes
EMO TC, PC, chiller, PD Box, VAC/RF rack
Chamber location / Type / Current process:
PC1: SCCM / Oxide etch
PC2: SCCM / Oxide etch
PC3: SCCM / Oxide etch
Etch chamber:
chamber type: SCCM
Wafer clamp: ESC
Turbo pump: STP-A2203W1-U
Generator model (Top): DAIHEN AGA-27B / 60 MHz / 2.7 kW
Generator model (Bottom): DAIHEN WGA-30C / 2 MHz / 3 kW
Gate valve: VAT pendulum type
Matcher (Top): DAIHEN AMN-30C11
Matcher (Bottom): DAIHEN WMN-30F
Process manometer: MKS 626A-23963 33.3 Pa
Self check manometer: MKS 626A-23693 1333.3 Pa
He pressure controller (center): UPC-4WS-C13S
He pressure controller (edge): UPC-4WS-C13S
Chart recorder: none
Gas box:
Manual valve: yes on each line
Transducer: yes on each line
Transducer displays: yes on each line
Regulator: yes on each line
Filter: yes on each line
Connection type: FUJIKIN IGS (Integrated Gas System)
Gas box pallet:
MFC type: STEC SEC-7330MC-UC-800A / SEC-Z512MGX
Gas line: (gas name, MFC size)
PC1:
Line 1: empty
Line 2: Ar / 1000 / SEC-7330
Line 3: CF4 / 100 / SEC-7330
Line 4: Ar / 200 / SEC-7330
Line 5: CHF3 / 100 / SEC-7330
Line 6: C2F6 / 50 / SEC-7330
Line 7: C4F6 / 50 / SEC-7330
Line 8: O2 / 50 / SEC-7330
Line 9: O2 / 500 / SEC-7330
Line 10: C4F8 / 60 / SEC-7330
Line 11: He / 300 / SEC-7330
Line 12: CH2F2 / 40 / SEC-7330
PC2:
Line 1: empty
Line 2: Ar / 1000 / SEC-7330
Line 3: CF4 / 100 / SEC-7330
Line 4: Ar / 200 / SEC-7330
Line 5: CHF3 / 100 / SEC-7330
Line 6: C2F6 / 50 / SEC-7330
Line 7: C4F6 / 50 / SEC-7330
Line 8: O2 / 50 / SEC-7330
Line 9: O2 / 1000 / SEC-Z512MGX
Line 10: C4F8 / 60 / SEC-Z512MGX
Line 11: He / 300 / SEC-7330
Line 12: CH2F2 / 40 / SEC-7330
PC3:
Line 1: empty
Line 2: Ar / 1000 / SEC-7330
Line 3: CF4 / 100 / SEC-7330
Line 4: Ar / 200 / SEC-7330
Line 5: CHF3 / 100 / SEC-7330
Line 6: C2F6 / 50 / SEC-7330
Line 7: C4F6 / 50 / SEC-7330
Line 8: O2 / 50 / SEC-7330
Line 9: O2 / 500 / SEC-7330
Line 10: C4F8 / 81.6 / SEC-7330
Line 11: He / 300 / SEC-7330
Line 12: CH2F2 / 40 / SEC-7330
Transfer chamber module:
Robot type: YASKAWA TYPE XU-RVM3800
Robot arm: aluminum / twin arm
Fork: tapered / ceramic with PTFE coating
Pressure sensor: Convectron gauge (Granville Phillips)
Gate valve: ROLLCAM (V TEX)
Signal tower (front): green, yellow, red
Cassette chamber module:
Wafer slot: 25
Dummy wafer slot: 4
Pre alignment unit:
Driver: YASKAWA TYPE XU-AVP3700
Remotes:
P.D. Box: 1
EMO button: yes
Line frequency and voltage: 50/60 Hz, 208 VAC, 3 phase
Remote UPS interface: yes, 1 phase, 200 V, 40 A
VAC/ RF Rack: 2
EMO button
RF lockout box: 1
Heat exchanger type: for PC SMC INR-497-005 x3
2001 vintage.
TEL / TOKYO ELECTRON Unity ME 8555 SSS is an etcher / asher that can be used to process a variety of substrates including, but not limited to, silicon, quartz, glass, ceramics, and metals. The equipment is especially designed for processing large diameter substrates in the range of up to 300 mm in diameter. It features a reactive ion etching (RIE) chamber, a fluorine-based chemistry delivery system, and a high temperature oxidation chamber. The RIE chamber utilizes a short-pulse plasma technique to achieve high rates of etch processing, with the capability to etch features down to 0.5 microns in accuracy. The fully automated delivery unit provides precise, reproducible process results and ensures that the gas chemistry is always maintained in a stable state. This ensures an even etch rate over the entire substrate. The oxidation chamber allows for post-etching of the substrate material, which can address various microstructure requirements. In addition, the oxidation process helps remove contaminants from the substrate surface. A process condition simulation machine is also available, which is designed to ensure the best possible conditions and results are achieved for each specific job. TEL Unity ME 8555 SSS is also capable of achieving high throughput rates due to its advanced automatic substrate handling capability. The tool is also compatible with various vacuum transfer modes and is designed to minimize contamination. The asset also has a user-friendly software interface that is designed to facilitate user operation and data access. Overall, TOKYO ELECTRON UNITY ME-8555SSS is a powerful etcher / asher that is capable of processing various substrates with excellent accuracy and process stability. It can also achieve high throughput rates, which make it ideal for large-scale production processes in the semiconductor industry. The user-friendly software interface ensures easy operation and data access, making it an effective and reliable tool for processors.
There are no reviews yet