Used TEL / TOKYO ELECTRON Unity #9142639 for sale

TEL / TOKYO ELECTRON Unity
ID: 9142639
Wafer Size: 8"
Vintage: 2003
Plasma CVD system, 8" 2003 vintage.
TEL / TOKYO ELECTRON Unity is a state-of-the-art etcher/asher for semiconductor manufacturing. It is designed to provide superior high-precision etching and ashing performance for today's sophisticated semiconductor technologies. The platform is based on a modular design, enabling it to be configured with a wide range of options, making it suitable for most semiconductor processes. The equipment features a full array of processes such as dry etching, wet etching, ashing, buffering, and molybdenum etching, and incorporates advanced film etching technologies for finer processes. It is also designed to offer high-precision, tight tolerances, and superior accuracy across all etching processes. The system's design helps ensure both efficient and reliable operation. The etcher/asher includes a high-density ECR source, which helps minimize exposure to dangerous electrical fields, and is also equipped with a comprehensive plasma source unit for maximum etching performance, including plasma optimization management. The machine also offers a large variety of process options, such as adjusting power and gas control values, vacuum mixtures, and substrate-to-gas ratio management. This ensures high-precision etching and ashing operations, regardless of how complex the process is. In addition, the tool is maintenance-friendly and upgradeable. The user can easily add new processes and components to their setup, such as changing the type of ECR source, or upgrading the asset with the latest in software and processors. It also offers remote-access capability, allowing the user to access the model's technical data, processes, information databases, and service manuals from multiple locations. TEL Unity is a powerful tool for fabricating the finest semiconductor components, offering superior performance, reliability, scalability, and affordability. Its advanced features, combined with comprehensive process control, make it the ideal solution for today's sophisticated semiconductor processes.
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