Used TEL / TOKYO ELECTRON Vigus harc #9244885 for sale

TEL / TOKYO ELECTRON Vigus harc is an etcher or asher designed for use in semiconductor fabrication processes. The equipment is based on microwave plasma enhanced chemical vapor deposition (PECVD), and is used to deposit thin films of silicon, germanium, and other materials on wafers in the form of an oxide, nitride, or metal layer. The etcher features a plasma source that is comprised of a low-pressure capacitively coupled RF discharge cell. The system is equipped with a multi-mode power supply that enables etching with a wide range of plasma gases, such as oxygen, tetrafluoromethane, CF4, chlorine, and nitrogen, as well as combinations of these gases. The etching chamber is equipped with a chemically-resistant inner wall and a hermetically sealed vacuum unit. A special heating unit is connected to the chamber to minimize the etching process temperature, thus allowing optimization of the etching results. TEL Vigus harc etcher is adapted to accept wafers of different sizes, from two to twelve inches in diameter. The machine is designed to be easy to use and includes a control console with a graphical user interface (GUI) to access all the tool settings, making process recipes convenient to program and modify. The etcher is also designed to be highly reliable, meeting the required industry standards for safety and product quality. Its advanced monitoring asset is able to detect any issues quickly and alert the operator, should any anomalies occur. The on-board communications model is also able to quickly send notifications to other connected devices and systems, allowing for better process monitoring and control. In conclusion, TOKYO ELECTRON Vigus harc etcher is a reliable and flexible etching solution with enhanced safety and product quality. Its advanced plasma source and processing capabilities make it an ideal tool for semiconductor fabrication processes.