Used TEL / TOKYO ELECTRON VIGUS MASK #9241307 for sale

TEL / TOKYO ELECTRON VIGUS MASK
ID: 9241307
Wafer Size: 12"
Vintage: 2009
Etcher, 12" 2009 vintage.
TEL / TOKYO ELECTRON VIGUS MASK is a state-of-the-art etching equipment from TEL. It is a non-standard lithography system used for manufacturing integrated circuits, semiconductor devices and other microelectronic components. This unit is used for chemical etching of thin films, for surface pre-treatment and for various chemical treatments of semiconductor substrates. It is primarily used for pattern etching and etching related treatments of semiconductor materials, including metals and polysilicon layers. It is designed to save time, minimize chemical waste, and optimize production throughput. TEL VIGUS MASK is equipped with a high-performance cathode ray tube (CRT), which is the main component of the machine. This CRT projects the photolithographic mask on the wafer in minute detail. The photomask is made of an opaque material such as chromium and is patterned with an image of the desired device structure. The mask is held in place by a special fixture, and the CRT projects a bright light through the mask and onto the wafer. The intensity of the projected light varies depending on the optical properties of the mask, allowing for precise control of the patterns being etched into the wafer. TOKYO ELECTRON VIGUS MASK is equipped with an ultraviolet light source, which is used for curing the photoresist and for other chemical treatments. It can also be used for cleaning and de-ionizing the wafer and for pre-treatment prior to etching. Additionally, VIGUS MASK is configured with an etching software, allowing operators to adjust etching process parameters such as dwell time, wafer temperature, and etchant concentration. Furthermore, TEL / TOKYO ELECTRON VIGUS MASK is designed with a back side sputtered aluminum chamber that provides additional protection against external contamination. It also comes equipped with an isolated oxide film layer produced by a reactive ion etcher, which helps to protect the thin film layers from oxidation during etching. This tool is designed to be extremely reliable and effective, offering advanced etching capabilities while minimizing toxic emissions and waste. In conclusion, TEL VIGUS MASK is a high-precision etching asset offering a wide range of features and capabilities. This model is perfect for use in semiconductor manufacturing, allowing for the accurate and efficient etching of various thin films and microelectronic components. This equipment is also designed to be cost-effective, offering a number of features that help to reduce waste and maximize throughput.
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