Used TEL / TOKYO ELECTRON Vigus Nest #293585745 for sale
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ID: 293585745
Etchers
TAC-3WWZZWW Power rack
(2) Loader modules
PM5
PM2
PM6
PM1, PM2, PM5:
TEL / TOKYO ELECTRON DC Power unit assy
SHIMAZU TMP-W3503LMC(T2) TMP
VAT 65048-JHGH-AX01 APC
MKS 722A21TGA2FA TMP PT Sensor
MKS 51A11TGA2BA010 VAC Pressure switch
MKS 41A130GA2AA040 ATM Pressure switch
(2) SMC XIAQ-25-X884 V36, 37 VAC Valves
SMC XLAQ-16HO-XO Gauge VAC valve
SMC CQEB-S63-44 5S-DCI825GI Shutter air cylinder
TEL / TOKYO ELECTRON V1Y-50-1024 EPD Sensor
TEL / TOKYO ELECTRON SE2000T EPD Controller
TEL / TOKYO ELECTRON SE2000-1M EPD Fiber
INFICON BPG-400 BA Gauge
MKS DMARETGAEKNV633 CM1
MKS DMA11TGAEKNN633 CM2
HORIBA GP-Z104-C HE PCV Center
HORIBA GP-Z104-F-2 HE PCV Edge
CKD TPR4-05-A100T-X0005 Gas flow splinter
MKS MW2-500340 Dual matcher
MKS GEW-3540 HF Generator
KYOSAN HV-PS8 HV Power supply
RKC RCB-88-2 Temperature cont box
JRC NFH-247 Heater filter
KYOSAN TW6 RF Filter
HORIBA IT-4700 Top thermometer
TEL / TOKYO ELECTRON Valve box assy
TEL / TOKYO ELECTRON TAB22E-1/LOW-LF LOW/PURF Board assy
(2) TEL / TOKYO ELECTRON TYB113-1/I01-LF LOW/PURF Board assemblies
TEL / TOKYO ELECTRON TYB22D-1/UP-LF UP Board assy
TEL / TOKYO ELECTRON TYB113-1/I01-LF UP Board assy
TEL / TOKYO ELECTRON TAB229-*/GAS2 UP Board assy
(2) TEL / TOKYO ELECTRON TYB113-1/I01-LF Gas board assemblies
(2) TEL / TOKYO ELECTRON TYB313-1/DND Gas board assemblies
RF Rack 1,2 (PM1, PM2, PM5, PM6):
SHIMADZU EI-D3503M-TV2 TMP Controller
MKS B-5303 LF Generator
TEL / TOKYO ELECTRON PR-IF PM V2E PR IF Box
KYOSAN HPK06ZI-TE4 DC Power supply
SHIMADZU EI-D3503M-7V2 TMP Controller
MKS B-5303 LF Generator
TEL / TOKYO ELECTRON PR-IF PM V2E PR IF Box
KYOSAN HPK06ZI-TE4 DC Power supply
TEL / TOKYO ELECTRON Water leak box
TEL / TOKYO ELECTRON PCW Line (Supply.return)
RF Rack 1,2 (PM1, PM2, PM5, PM6): TEL / TOKYO ELECTRON E2B030-12/KVD FPDIF
Missing parts
PM1: Top valve box cover
PM2:
Front cover side fan
TAB229/Gas2 Board cover
Top valve box cover
PM5:
TAB229/Gas2 Board cover
Chamber right: Duct cover
Top valve box cover
AC Dist 1, 2:
KYOSAN J-P33C33G33G33-HH-HPA AC Rack
(2) FUJI ELETRONICS SA203CUL Main breakers 1, 2
FUJI ELETRONICS EA103CUL CVCF Breaker
DENKEN SEIKI NCT-F5 Transformer
TEL / TOKYO ELECTRON TAB343-1/AC Board.
TEL / TOKYO ELECTRON Vigus Nest is a dry etching tool designed for wafer processing for applications in the semiconductor and photovoltaic industries. It is a high-performance tool designed for dry processes like etching and deposition. TEL Vigus Nest is capable of etching silicon, germanium, polysilicon and a variety of other materials. The tool is equipped with two main chambers including the main etching chamber and the loadlock chamber. The main chamber contains the upper and lower resistance heated platen units, while the loadlock chamber has a single resistance heated platen unit. The heating platen unit can be used to etch both sides of a wafer in one batch process, increasing throughput. This system is also capable of controlling the temperature and substrate stability in order to achieve repeatable results. TOKYO ELECTRON Vigus Nest also utilizes a multi-stage, multi-zone RF plasmatron equipped with an independent control processor, allowing for precise and control of the plasma power density and etching conditions. The tool has a total of eight RF plasmatrons, with a maximum power output of 25kW. It also has three gas injectors that can be operated in pulsed, constant flow, and closed-loop mass flow control modes. This enables flexibility in etch process design to achieve optimal results. The tool also comes with software for recipe development, performance monitoring and operating system diagnostics, enabling users to maximize the capabilities of Vigus Nest. The software allows for easy programming for even complex etch processes and provides comprehensive data maintenance for easy reference. Users can also track the etching data and other process parameters, providing valuable insights and feedback to optimize the etch process. Overall, TEL / TOKYO ELECTRON Vigus Nest is a versatile etching tool that is suitable for a wide range of applications in the semiconductor and photovoltaic industry. It offers excellent control and repeatability to enable accurate etching processes with high throughput. The comprehensive software provides a comprehensive platform for optimization and data maintenance to help users achieve the best results.
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