Used TEL / TOKYO ELECTRON Vigus #9235079 for sale

TEL / TOKYO ELECTRON Vigus is an etcher or asher that provides optimal performance, precision control, and versatile application by combining advanced etching/ashing concepts with a variety of technological innovations from TEL. TEL Vigus etcher's platform consists of a base frame, a vacuum chamber, an etch chamber, and a control unit. The base frame houses the chamber and control unit and provides mechanical stability and a sturdy foundation. The chambers are designed for precise temperature and pressure control, and to provide precise uniform and repeatable etch/ash processing. The control unit contains a vacuum pump, temperature controller, process monitoring systems and recipes, as well as a PLC to control process parameters, and power to the etcher. TOKYO ELECTRON Vigus has 6 process gases, which can be delivered to the process chamber with precise flow rates, speeds, and pressures. This makes it possible to precisely control etch/ash processing and achieve tight uniformity and repeatability when processing multiple wafers simultaneously. A quartz viewport is provided for visual inspection of the process. Vigus also integrates many additional processes and features. To help ensure process repeatability, a stacking mechanism for wafer storage, loading, and unloading is available. In-situ metrology capabilities allow for accurate process control, without additional external metrology. Process recipes can be quickly adjusted and transmitted from a PC via a RS232C interface. The vacuum chamber of TEL / TOKYO ELECTRON Vigus is equipped with a differential pump. This allows for fast pump-down times and a very stable, low-pressure environment. The environmental chamber can accommodate a maximum of 200mm substrates, and an optional Large Batch Plate (400mm) can be added. This provides TEL Vigus with the flexibility to process a wide range of substrates. TOKYO ELECTRON Vigus is a reliable, precisions etcher/asher that is capable of processing a wide range of substrates. It provides a high degree of process control and uniformity, allowing users to achieve their desired and repeatable process results.