Used TEL / TOKYO ELECTRON Vigus #9270936 for sale

TEL / TOKYO ELECTRON Vigus
ID: 9270936
Etcher, 12" 2008 vintage.
TEL / TOKYO ELECTRON Vigus is an advanced etcher/asher used in the semiconductor industry for precision etching, shaping, and patterning of silicon and other materials. This high-tech equipment is based on several key technologies, which allows it to offer superior accuracy and repeatability. Its advanced etching process involves a closed-loop control equipment that precisely monitors and adjusts etched pattern dimensions. TEL Vigus offers a versatile etching chamber and substrate stage assembly, which allows for patterning and etching of complex features such as through-holes, BGA lids, and thick components. This ability to accurately etch precise features allows manufacturers to significantly reduce process variability and yield losses. Additionally, the advanced optics of TOKYO ELECTRON Vigus reduces etch by-products by reducing beam exposure. Vigus is equipped with dual gas delivery systems that supply different gases for etching and sidewall coverage. This system allows etching step to be completed without interruption, reducing reaction time and optimizing uniformity of etch pattern. This etcher can also output multiple scan modes, to allow precise control of etching speed across a wide range of parameters. Additionally, TEL / TOKYO ELECTRON Vigus offers capacitively coupled plasma (CCPMA) technology, setting the etching power independently, based on the type of wafer material in use. TEL Vigus is also designed for safety and stability. The advanced control unit features a self-diagnostic machine that checks for procedural errors, to prevent possible tool damage. Additionally, an integrated safety asset ensures that the etcher always remains within the assigned parameters, even with slight changes. Overall, TOKYO ELECTRON Vigus is an advanced etcher/asher that offers a wide range of features and capabilities for semiconductor production. Its advanced etching technology provides precise control of the etching process, while its dual gas model reduces reaction and etching time. And the integrated safety systems ensures that the equipment remains stable and reliable in the most demanding semiconductor production environments.
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