Used TEPLA 300 #9229832 for sale

TEPLA 300
Manufacturer
TEPLA
Model
300
ID: 9229832
Wafer Size: 6"
Plasma asher, 6".
TEPLA 300 is a high-performance etcher/asher used for the removal of metallic and non-metallic layers from substrates in research, production and manufacturing applications. It is designed for high-precision thin-film surface processing and provides a highly controllable and repeatable etching/burning process with a low temperature range of -55 to +195°C. 300 is equipped with adjustable temperature control and accellerated process control, allowing for improved accuracy and reliability of the etching/burning process. TEPLA 300 is constructed from a rugged aluminum housing and is designed with easy-to-use process control panel with all necessary indicators and control buttons. The system features an integrated high-voltage electrolift generator for optimized process dynamics, as well as a separate cooling source and dedicated connection packs for each process area. The unit is also equipped with an infrared fingerprinting system to monitor etch/burn time and uniformity for uniform and repeatable process results. 300 offers users highly accurate and consistent laser processing with resolutions down to 5nm, allowing for precise control during the etching/burning process. The controllable process parameters include current, voltage, repetition rate, scan area, process depth and substrate material, allowing for optimum etching/burning performance on virtually any material. TEPLA 300 is designed for high-throughput processing, with a single run cycle time of less than 5 minutes, and is capable of etching/burning up to 50 x 25 inches (1,200mm x 600mm) of substrate. Additionally, the system features an independent automatic lamination station for substrate lamination and removal, as well as mechanized height control and optional temperature profiling capabilities. 300 is an ideal solution for rapid, precise, and cost-effective removal of thin film layers from complex substrates. It offers a robust aand reliable etching/burning process for a wide range of applications.
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