Used TOK OAPM-301B #9111751 for sale

TOK OAPM-301B is a high performance etcher / asher equipment, designed for use in a variety of applications that require precision etching / ashing of substrates. It features a state-of-the-art design with a compact, easy-to-operate system that is suitable for both manual and automated operation. OAPM-301B is designed to provide rapid etching and/or ashing of substrate materials, and features superior repeatability for consistent results. TOK OAPM-301B is equipped with a high-powered, high-efficiency plasma etcher. The power source is capable of providing a wide range of power settings to match the etching or ashing application, thus providing optimal performance on a variety of substrates. This etcher draws inert atmosphere from a separate source and mixes it with the plasma during the etching or ashing process. The plasma power level may be adjusted from 0 to 600 Watts, making this unit well-suited to both light and heavy etching or ashing applications. OAPM-301B features a temperature-controlled substrate holder and a self-contained quad-level vacuum chamber that allows for rapid cycle times and uniform evacuation of the etching or ashing environment. This vacuum machine is temperature controlled and maintained by a water/glycol tool to ensure optimal performance and repeatability. The chamber features a low pressure range of 0 to 10 mbars absolute and a wide frequency range of 0 to 10kHz. The asset is designed to be easy-to-use, with an intuitive user interface and clearly-labeled and organized control knobs and buttons. A variety of optional add-ons are also available, including an automatic door opener/closer, automated operation model, user-programmable recipes, and auto-stirring capabilities. All these features make TOK OAPM-301B an excellent choice for precision etching or ashing applications.