Used TRION Orion III #293800217 for sale

TRION Phantom LT is an advanced etcher/asher equipment designed for high performance and versatility in semiconductor manufacturing processes. This cutting-edge tool incorporates innovative technologies to deliver precise and uniform plasma processing for a variety of applications, including etching, ashing, descumming, and photo resist stripping. One of the key features of Phantom LT is its multiple process capabilities, allowing for the customization of various plasma processes to meet specific requirements. The system is equipped with a high-frequency RF power source and a range of gas injection options, enabling users to control parameters such as pressure, gas flow rates, and power levels for optimal process performance. Additionally, the unit is equipped with advanced endpoint detection capabilities to ensure accurate process control and endpoint determination. TRION Phantom LT features a dual gas line design, which allows for independent control of two process gases, enabling the execution of complex processes with different gas chemistries. This flexibility makes the machine well-suited for a wide range of applications, from etching silicon dioxide and silicon nitride to stripping photoresist and cleaning substrate surfaces. The tool's chamber is constructed from high-quality aluminum and is designed to provide uniform plasma distribution across the entire surface of the wafer. This ensures consistent processing results and minimizes the risk of non-uniform etching or asher effects. The chamber is also equipped with temperature control features to optimize process stability and repeatability. Phantom LT incorporates advanced plasma generation technology, utilizing high-density plasma sources to achieve efficient and uniform processing. This enables fast and effective removal of organic and inorganic materials from semiconductor substrates, resulting in high-quality etching and stripping results. The asset is also equipped with a dynamic gas injection model, which enhances process control and enables precise tuning of process parameters for optimal results. The equipment's user-friendly interface and intuitive software make operation and process monitoring straightforward and efficient. The software provides real-time process data visualization, enabling users to monitor key parameters such as pressure, temperature, power, and gas flow rates. Additionally, the system's recipe management functionality allows for easy process optimization and control, ensuring consistent and repeatable results. In conclusion, TRION Phantom LT is a state-of-the-art etcher/asher unit that offers unparalleled performance and flexibility for semiconductor manufacturing applications. With its advanced plasma processing capabilities, precise control features, and user-friendly interface, the machine is ideal for a wide range of processes, from etching and stripping to cleaning and surface modification. Whether used in research and development or high-volume production environments, Phantom LT delivers reliable and high-quality results, making it a valuable tool for semiconductor fabrication.