Used TRION Phantom III #9039844 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9039844
RIE / ICP System
Bottom electrode: 8”
Vacuum port: 6"
System controller: Pentium computer, touch screen
(6) Mass flow controller gas channels
Automatic pressure control
Automatic RF tuning of bottom electrode, RF generator: 600 watt 13.56 MHz
Automatic RF tuning of ICP coil, RF generator: 1250 watt 13.56 MHz RF generator
Cryogenic chuck: 100mm wafer, temperature control, -50ºC to 100ºC
Electrostatic chuck: 6", He backside cooling
Emergency on/off with AC power distribution box
Components:
High vacuum Pump: Osaka TG1003BW and Osaka TC1003 controller
Backing mechanical pump: none
High vacuum valve: VAT 98801-R1 valve
Chamber pressure transducer: MKS 627
RF1 Generator: Comdel CX-600AS, RF1 automatch = Trion OEM
RF2 Generator: Comdel CX-1250S, RF2 automatch = Trion OEM
Heat exchanger: none
Chuck heat exchanger: Julabo LH85
Elecrostatic Chuck: Gripping Power EPS200
Gas Controls:
Separate exhausted cabinet for gas mixing
He backside MFC: MKS 649A, 10sccm Cal’ed for He, used with He
Gas 1 MFC: Unit 8100 250 sccm. Cal’ed for N2, used with CF4
Gas 2 MFC: Unit 8100 100 sccm. Cal’ed for N2, used with O2
Gas 3 MFC: Unit 8100 100 sccm. Cal’ed for N2, used with Ar
Gas 4 MFC: Unit 8100 250 sccm. Cal’ed for N2, used with SF6
Gas 5 MFC: Unit 8100 250 sccm. Cal’ed for N2, used with CHF3
Gas 6 MFC: Unit 8100 100 sccm. Cal’ed for N2, used with C4F8.
TRION Phantom III is a state-of-the-art etcher/asher designed for automated high throughput, precision, and consistent results. It is an important tool for research and development foundries, which require rapid and precise processing in order to produce complex shapes and features on an industrial scale. Phantom III utilizes a Dual-Focused Ion Beam (FIB) equipment, which utilizes two types of ion beams - one for etching and one for deposition - for concurrent processing of the same sample. This allows for faster processing times and increased accuracy. The Dual Focused Ion Beam also provides the benefits of higher beam current stability, concurrent ion beam energy and spot size adjustment, and a wider range of process parameters. TRION Phantom III is capable of handling a wide variety of wafers, from those conventionally processed with E-Beam, to those that require ion beam etching and ashing. With its high aspect ratio etching of up to 100:1, seamless transformation from feature to feature, and fast, reliable processing, Phantom III is a versatile and powerful etching tool. TRION Phantom III etcher/asher is also equipped with other features, such as an in-situ heating system, an anti-recoil mechanism, and process parameters that allow rapid process changes in a controlled environment. Additionally, the unit can be programmed with custom-designed etching recipes, allowing for complete customization of etching results. Phantom III also features a real-time process monitoring machine, which allows users to monitor the process in real-time to ensure conformity and accuracy. The tool also allows for direct access to process data and statistical process control (SPC). In conjunction with its broad capabilities, TRION Phantom III includes integrated safety features in its design. Central to these features is the active sputtering protection asset, which offers protection against sample contamination and process irregularities. In conclusion, Phantom III is a sophisticated etcher/asher designed for automated high throughput, precision, and consistent results. It utilizes a Dual-Focused Ion Beam model, is capable of handling a wide variety of wafers, and includes safety features such as an active sputtering protection equipment. With its robust features and customizability, TRION Phantom III is an excellent tool for research and development foundries.
There are no reviews yet