Used TRION Phantom III #9167672 for sale

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Manufacturer
TRION
Model
Phantom III
ID: 9167672
Wafer Size: 8"
Vintage: 2008
Reactive ion etcher (RIE), 8" ICP System (4) On board mass flow controllers Gases: Ar O2 CF4 N2 CHF3 Utilizes: Surface mount C-Seal technology Orbital welded VCR fittings Pump: Vacuum pump, chiller Temperature controlled chiller (2) RF Generators 600, 13.56 MHz Automatic matching network Software: Trion 2008 vintage.
TRION Phantom III is a versatile, high-performance etcher and asher for a variety of semiconductor substrates. It is able to perform all of the etching and ashing steps necessary for the manufacture of advanced microelectronic devices. The main features and capabilities of Phantom III include: High-rate etching performance and low-particle generation for fabricating ultra-small device features. Ability to etch and ashing in the same chamber with the same process. High-precision wafer location control equipment and improved uniformity, throughput, and repeatability. Closed-loop plasma tuning and control for controlling etch rate. AutoFill automated process for faster wafer changing and improved throughput. Advanced etching techniques for nanometer scale fabrication and microfeature fabrication. Loadlock system with multiple rotor configurations to enable batch processing. Continuous dry pump unit for improved safety while performing etching and ashing processes. High-precision multi-process wafer and die lift machine ensures precise alignment of parts. Capable of producing milliseconds-level resolution in pattern formation. Ability to measure etch depth and evaluate etching results in real-time. Fully automated operation and maintenance program to ensure productivity and quality. Flexible software package with secure data access control, error tracking, and real-time process monitoring and control. Complete fault detection and diagnostics tool to ensure reliability and safety.Asset equipped with an automated wafer handling and clean-up model to save time and labor. Fully configurable to meet specific process needs. TRION Phantom III offers improved performance with lower lifetime cost and has been proven to enable significant cycle-time and throughput improvements. Phantom III is specifically designed to provide a robust, reliable, and cost-effective etching and ashing process for the fabrication of advanced electronic devices.
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