Used TRION Titan #293670453 for sale

TRION Titan is a dedicated deep reactive ion etcher/asher for a wide range of materials. It has a unique design with two electrically isolated chambers for etching and ashing which eliminates sample contamination while enabling a high productivity, cost-efficient process. The equipment produces precise etching and ashing with superior profile characteristics and high throughput. It is capable of etching and ashing films from a few angstroms to a couple of microns in thickness. The etching process is powered by an RF power source delivering between 1 and 1000 watts of power onto a post integrated into the etching chamber. The post transforms the RF energy into ions which are then accelerated towards the sample. The post is adjustable in height to enable matching of the RF frequency with the incoming ions. The etching process is augmented by the injection of an etchant gas which increases the etching rate and improves the etch depth uniformity. The system can be used for dry etching, wet etching, and directional etching. The ashing process is powered by a DC power source delivering up to ten hundred volts of power onto a post integrated into the ashing chamber. The post then transforms the DC energy into ions which are then accelerated towards the sample. These ions remove the top layer of material from the sample. As with the etching, the ashing process can be augmented by the injection of an ashing gas again increasing the ashing rate and the resulting depth uniformity. Titan has a full suite of process monitoring and metrology hardware installed to ensure precise etching and ashing of each individual sample. The unit is capable of monitoring in-situ end-point detection during etching and ashing process allowing for precise control over the etching and ashing profiles. Furthermore, this machine is capable of measuring the resulting profiles using laser interferometry and optical profilometers. TRION Titan is an ideal tool for research and production processing of a wide range of materials especially for applications such as high aspect ratio MEMS, nano-patterning, and micro-fluidics due to its unique design for both etching and ashing.