Used UNAXIS / NEXTRAL 100 #9258327 for sale

UNAXIS / NEXTRAL 100 is a versatile vacuum etcher/asher ideal for a range of applications. It is well-suited to creating high-definition microstructures, as well as thin film photoresists. The etcher/asher is easy to use and can be reliable, even in rough operating conditions. It is also energy efficient and MSL compliant, making it well-suited for various processes and industrial settings. The device features a non-contact electrostatic chuck that helps to improve etching yield. This chuck also prevents target material from sticking to the working surface and ensures a more even etching surface. The chuck also prevents the formation of surface undulations and particles, which can lead to microstructural instability or poor edge resolution. UNAXIS 100 is also equipped with a Backside Ion Source (BSI) which contains up to four independent emitters to facilitate multi-implantation processes. BSI-optimized substrates can be placed in single- or multiple-chamber configurations to facilitate the etching and ashing of intricate microstructures. The BSI feature also helps to ensure uniform and repeatable processes. The device is also optimized for quick process turnaround times. This is facilitated by the fast-response time of the BSI, as well as the uniformity of the plasma etching. Furthermore, the etcher/asher is equipped with an on-board configurable mass flow controller for precise and optimized process parameters. This allows users to optimize the settings for different materials, such as polymers, silicon, glass, and other types of substrates. Finally, NEXTRAL 100 is also equipped with a comprehensive touchscreen display and a multi-language menu for convenient data manipulation and control. This enables easy reading of process results in real time, as well as process adjustments on the fly. In conclusion, 100 etcher/asher is an effective and reliable device that is well-suited for a range of etching applications. With its energy efficiency and programmable features, it is ideal for both industrial or laboratory settings.