Used UNAXIS / NEXTRAL N 860 #9125878 for sale

UNAXIS / NEXTRAL N 860
ID: 9125878
Plasma etcher.
UNAXIS / NEXTRAL N 860 is a chemically-mechanically etching and ashing equipment with an integrated load lock. This system utilizes plasma and wet-etching techniques to enable a wide range of process applications. With its optimized control unit, UNAXIS N 860 is capable of providing superior film thickness uniformity and superior film quality. NEXTRAL N 860 utilizes a plasma etch chamber that is equipped with inductively coupled coils to produce a non-equilibrium plasma with a large range of power levels. This chamber is also equipped with an RF matching network, gas bubbler, and vacuum pump to ensure optimal plasma conditions. The chamber also contains a quartz tray and thermocouple to provide temperature control and precise control over film etching parameters. The machine is integrated with a mechanically agitated chemical wet etch chamber. This chamber is equipped with jets, pumps, and valves to enable the chemical etching of materials. The wet etch chamber is made of stainless steel and designed to be compatible with a variety of chemicals. The tool is programmed with recipe management software which allows process parameters to be entered in the recipe management asset. The software provides a variety of capabilities such as etching and deposition time control, as well as chamber temperature control via the integrated thermocouple. N 860 also features an integrated load lock which provides temperature control and operational stability for etching and deposition processes. The load lock is pressure sealed and made of stainless steel, providing a clean and safe environment for etching and deposition operations. UNAXIS / NEXTRAL N 860 etching and ashing model is a powerful tool for high-quality etching and ashing operations. Its optimized control equipment and wide range of process applications enable it to provide superior uniformity and film quality. In addition, its integrated load lock ensures temperature control and operational stability.
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