Used UVOCS T10X101/0ESIE #293593213 for sale

UVOCS T10X101/0ESIE
Manufacturer
UVOCS
Model
T10X101/0ESIE
ID: 293593213
UV Ozone cleaning system.
UVOCS T10X101/0ESIE is a high-performance etcher and asher suitable for a range of applications. It is a batch equipment featuring an advanced needle beam chamber design capable of accommodating up to 10 200 mm sample wafers for etching and up to 300 mm sample wafers for ashing. The T10X101/0ESIE model also features a LPCVD chamber that can be used for depositing films. The chamber of the T10X101/0ESIE model is designed to ensure optimal gas flow along the axis and onto the sample. It features a 7-zone thermal conduction heating system with fully closed loop and regulation, infrared heaters for substrate heating, two secondary chambers for process parameters stabilization and Helios planar bolometer for real-time etch end-point determination. Additionally, the unit is equipped with an advanced thermal control machine providing uniform processing conditions along the full wafer diameter. The T10X101/0ESIE etcher and asher utilizes an integrated process control tool (IPCS) with advanced intuitive touch-screen user interfaces. This allows users to easily configure the asset parameters needed for etching and ashing. Moreover, it features an Auto-Etch program, which enables automatic etch recipe optimization, as well as up to 10-decimal places for etch rate accuracy. The model also allows for variable recipe parameters depending on the material to be etched or ashed. Also, the T10X101/0ESIE equipment is equipped with process gases intake and full exhaust control, laser illumination and simple placement system for user convenience and safety. The model is capable of achieving high etching and ashing rates while minimizing surface damage and other process artifacts. Ultimately, UVOCS T10X101/0ESIE etcher and asher offers a high-performance and reliable solution for a number of etching and ashing processes. Its precision controls, advanced chamber design and intuitive interface make it an attractive option for research and development laboratories, as well as industrial applications.
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