Used VACTRONIC 2000-M #161821 for sale

VACTRONIC™ VACTRONIC 2000-M etcher/asher is a versatile, high-performance machine designed for the etching and ashing of semiconductor substrates. It utilizes a combination of physical sputtering and chemical etching to create surface patterns in a wide range of materials, including aluminum, silicon, ceramics, gallium arsenide, and polysilicons. The machine is equipped with a modular etching chamber, a cooling equipment, and a gas delivery system that allows for precise control of etching parameters. The etching chamber of VACTRONIC™ 2000-M is constructed of stainless steel and is hermetically sealed to ensure safe and effective operation. Within the chamber there resides a unique unit of nozzles that provide an even distribution of etchant, in either steam or gas form, to the substrate. The gas delivery machine features an advanced tool of valves and metering devices, allowing for precise control of the flow of etchant gas. This asset also features a vacuum-assisted gas delivery model to ensure that no etchant gas is wasted or left in the chamber after etching. The cooling equipment of VACTRONIC™ VACTRONIC 2000-M provides an even temperature distribution within the etching chamber. This allows for precise control over the etching process, ensuring that the substrates are etched accurately and consistently. The cooling system also helps minimize the amount of heat generated during the etching process. The machine's versatile design enables it to be used for both vertical and horizontal etching applications. The gas delivery unit and etching parameters ensure accuracy and repeatability across etches, allowing for higher yields and throughputs. The modular design allows for easy installation and operation. VACTRONIC™ 2000-M etcher/asher is an ideal choice for etching a wide variety of materials, from aluminum and silicon to gallium arsenide and polysilicons. Its modular construction allows for easy installation and operation and the advanced gas delivery and cooling systems enable precise control over etching parameters, ensuring accuracy and repeatability. The machine is also capable of producing high-resolution etch patterns that are ideal for a variety of applications, making it an ideal choice for etching and ashing of substrate.