Used VEECO Microetch LL250 #59880 for sale
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ID: 59880
Automatic loadlock ion mill, 4"
Optical / Fiber optic system for endpoint detection
Square substrates:
Can be modified to accept 4" round substrates
System used to mill:
Platinum
Titanium
Nickel
Copper
Nichrome thin film metals
Anisotropic etching includes:
Au, Cu, Ni, Cr, and TiW
Multistep etch processes for stacked layers (MLC, MCM):
Ceramics
Hybrids
Thin film heads
Flat panel displays
High frequency devices
Process flexibility with IBE, RIBE, CAIBE, flowcool substrate cooling
Rotation and tilting options configured
Pumping system includes:
Mechanical pump and turbo pump for main chamber
Mechanical pump and turbo pump for load lock / Transfer chamber
Spare parts:
Magnetic sensor
Shutter gear assembly
Shutter worm gear
Molly screws for source
Tungsten source wire
Tungsten neutralizer wire
Assorted insulators
Assorted O-rings
Fixturing plates, 4"
PC:
Comark
Model: 4000 Series
INTEL 486i
1994 vintage.
VEECO LL 250 is an ion milling equipment that is used for the fabrication of nanostructures. It is the perfect tool for production of high quality nanostructured surfaces, particularly for applications in the electronics and opto-electronics industries. This system relies on focused ion beams to achieve superior surface quality and features an advanced ablation chamber with an ergonomic design. VEECO Microetch LL250 is a field-programmable unit that allows for the customization of milling parameters. It features a broad range of beam energies, pulse lengths, and gas pressures. The full range of beam voltage can be adjusted to tailor milling functions for different substrates and materials. The machine also offers advanced ion beam diagnostics and systems monitoring, including ion beam current and energy controls. LL 250 features a quadrupole-based ion beam column that allows for a wide range of beam (electron) energies. This allows for a greater flexibility and customization of milling profiles. The flexibility of energy and pulse length makes Microetch LL250 suitable for various ion etching steps, such as materials for MEMS, bio-microfluidics, and optical components. In addition, VEECO LL 250 has a high-resolution imaging stage that allows for precision alignment and orientation of the substrate. This is critical in order to guarantee a consistent process across the wafer size. Its image capture and drift correction patterns also provide significant development cost savings and improved cycle times. VEECO Microetch LL250 also incorporates a dynamic beam shaping feature to minimize non-uniform or distorted ion profiles that can be caused by uneven beam energies or spacings. This dynamic beam shaping ensures the highest quality etching and processes for a wide range of substrates and materials. LL 250 also offers extremely low noise levels during its operation. This is important for use in cleanroom operations and for devices with sensitive electronic components. It also includes optional accessories to further reduce noise levels. Overall, Microetch LL250 is a versatile, high-performance ion milling tool that is perfect to achieve nanostructures with great surface finishes. Its wide range of functions, features, and performance make it ideal for the production of nanostructured surfaces in the electronics, opto-electronics, and MEMS industries.
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