Used VEECO Microetch LL250 #9100793 for sale

ID: 9100793
Wafer Size: 4"-6"
Ion beam etchers, 4"-6" Pumps included.
VEECO Microetch LL250 is an advanced etcher / asher designed for material etching and ashing in semiconductor and MEMS/NEMS applications. It features an open-access configuration that makes for faster loading and unloading of substrates, as well as integrated controllers, software-driven recipe parameters, and touchscreen interface for intuitive programming. It also provides a wide range of process parameters and capabilities to meet the requirements of various applications. VEECO LL 250 houses a thermally controlled process chamber with ceramic insulation, designed to ensure uniform heating and cooling for more consistent results. It is fitted with a x-y scanner that provides accurate substrate positioning, while the precision micro-valve nozzle provides high-speed production and superior selectivity and uniformity. Additionally, the unit includes an in-situ system that allows for real-time monitoring and control of critical process conditions. MICROETCH LL 250 is powered by a high-performance, multiprocessor control system that offers precise and repeatable process control. It offers advanced power supply management and diagnostics to ensure consistent and repeatable results, along with an automatic calibration monitor that reduces maintenance time. Additionally, the unit includes a number of diagnostic and preventive maintenance features to help maintain performance over time. In addition, VEECO MICROETCH LL 250 features a number of safety features. This includes over-temperature protection, reactant management, and an automatic gas shutoff to prevent gas leakage in case of process failure. Additionally, the unit is equipped with secure physical shielding, as well as optical and gas sensors designed to detect and protect against flammable concentrations of gases. LL 250 is ideal for high-precision etching and ashing processes. It offers a wide range of process capabilities, intuitive control, and reliable performance, making it an excellent solution for etching and ashing operations in semiconductor and MEMS/NEMS applications.
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