Used YES / GLEN G 1000 #293735345 for sale
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ID: 293735345
Plasma cleaner
(5) Trays
Operation temperature: 20-100°C
N2 Flow rate: 1.7 SCFM
Process gas flow rate: 20-50 SCCM
Interior chamber dimension (W x D x H): 45.72 x 45.72 x 30.48 cm
Chamber material: 6061-T6 Aluminium
SEMI Compliance: S2/S8
Mass Flow Controller: Up to 3
Range for exposure time: 0-1200 Seconds (20 Minutes)
Resolution of timer setting: 1 Sec
Performance:
RF Plasma power: 0-1000 W @ 550 VAC
RF Leakage magnetic: 0.6 mA/m, 4.15 x 10-7 A2/m²
RF Leakage electrical: 1.6 V/m, 4.2 V2/m²
Nitrogen consumption: 0 SCF, 6.8 SCF, 1.7 SCF
Power consumption with pump: 375 W, 1000 W, 640 W
Reactant gas consumption: 0 SCF, 20-50 SCCM
Heat emission: 920 W
Power requirements: 200-250 VAC, 20 Amps, 50/60 Hz, Single phase
Does not include pressurized cylinder gas.
YES / GLEN G1000 is a highly advanced etcher and asher equipment designed for precise and efficient processing of semiconductor wafers and other substrates. This versatile tool offers a wide range of capabilities, making it ideal for research and development, as well as high-volume production environments. With its exceptional performance and reliability, YES G-1000 is a popular choice among semiconductor manufacturers and research institutions worldwide. GLEN G 1000 is a dual-chamber system that combines etching and ashing capabilities in a single platform, providing users with unparalleled flexibility and process control. The unit features a high-power RF plasma source that allows for fast and uniform etching of various materials, including silicon, silicon dioxide, silicon nitride, and metals. The dual-chamber design enables users to switch between etching and ashing processes quickly and easily, without the need for manual chamber reconfiguration. One of the key features of G-1000 is its advanced process monitoring and control capabilities. The machine is equipped with multiple sensors and monitoring tools that enable real-time monitoring of process parameters such as pressure, temperature, and RF power. This allows users to optimize process conditions for maximum performance and repeatability. YES / GLEN G 1000 also features advanced gas flow control systems that ensure precise control of gas flow rates and ratios, enabling users to achieve highly uniform and reproducible results. In terms of performance, YES G 1000 excels in both etching and ashing applications. The tool can achieve high etch rates and excellent uniformity across large wafer sizes, making it well-suited for high-volume production applications. YES / GLEN G-1000 also offers precise ashing capabilities for removing photoresist and other organic contaminants from wafer surfaces. The asset's adjustable ashing parameters allow users to optimize process conditions for different materials and process requirements. YES G1000 is designed with user convenience in mind, featuring a user-friendly interface and intuitive software controls. The model's software interface allows users to easily program and monitor process recipes, as well as access advanced diagnostic and troubleshooting tools. G1000 also offers remote monitoring and control capabilities, allowing users to monitor and control the equipment from a remote location for added convenience and flexibility. In addition to its advanced capabilities and performance, G 1000 is also highly reliable and easy to maintain. The system is built with high-quality components and materials that are designed to withstand the rigors of semiconductor processing environments. GLEN G1000 features a modular design that allows for easy access to all major components for maintenance and servicing. Additionally, the unit is equipped with self-diagnostic tools that help users quickly identify and resolve issues to minimize downtime and maximize productivity. Overall, GLEN G-1000 is a top-of-the-line etcher and asher machine that offers unmatched performance, versatility, and reliability. With its advanced process control and monitoring capabilities, high-performance etching and ashing capabilities, and user-friendly interface, YES / GLEN G1000 is the perfect choice for semiconductor manufacturers and researchers seeking a cutting-edge solution for their processing needs.
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