Used YES / GLEN R1 #9049956 for sale

YES / GLEN R1 is an advanced etching and chemical ashing equipment designed for the preparation of wafers prior to semiconductor manufacturing processes. It was developed by YES Technology and features the ability to perform both dry-etch and chemical ashing processes in a single system. The unit contains a reactive-ion etcher (RIE) for dry-etch processes and an inductively coupled plasma (ICP) for chemical ashing. All processes can be performed in an inert gas environment using a wide variety of gases. The machine is equipped with a number of safety features, such as overpressure protection and ion beam current limiting, to ensure the safe operation of the tool. YES R 1 combines advanced automation and software features to provide highly repeatable etching and ashing performance. It has an open architecture computer interface for control, data acquisition, and process optimization. The asset is also capable of thermal ashing, using a resistive heating element that can achieve temperatures of up to 9500°C (17,000°F). GLEN R-1 is equipped with a field-emission scanning electron microscope to ensure precise alignment of the sample to the substrate prior to processing. It also incorporates a robotic sample loader to facilitate sample handling. The model is equipped with numerous diagnostic, monitoring, and safety features to ensure that the equipment operates reliably and safely. The system is also capable of storing and tracking recipe information in a secure database to ensure consistent process results. R 1 is highly flexible, making it well suited for a wide variety of semiconductor etching and ashing applications. Its combination of sophisticated automated features and advanced safety and control make it ideally suited for advanced semiconductor production processes.