Used YES / GLEN R1 #9172427 for sale

Manufacturer
YES / GLEN
Model
R1
ID: 9172427
Plasma cleaner.
YES / GLEN R1 is an etcher or asher designed for use in the electronics and semiconductor industries. It is a fully-automated etching equipment that utilizes reactive ions to etch both organic and inorganic materials with many layers at a time. The core of this system is a proprietary eductor nozzle using ionized gas, a deposition unit, and a CCD camera-based imaging machine. The eductor nozzle contains a field-emission source that creates a plasma field. At the core of this field is the reactive gas, which is composed of inert gases and a reactive gas such as oxygen or fluorine. The eductor nozzle accelerates the plasma field out of the nozzle and creates a jet of ions that interact with the substrate. These ions etch into the material, removing it at the molecular level. The second component of the tool is the deposition asset, which can add layers of materials such as metals, plastics, and ceramics on top of the substrate. The deposition model uses thermal evaporation and chemical vapor deposition to add coatings of the desired material. These processes are combined with the etching process to complete multi-level processing of substrates. Finally, the imaging equipment provides real-time visual feedback on the etching and deposition process. This is accomplished through the CCD camera, which provides images of the process from multiple angles, displaying the etched layers. This real-time monitoring ensures accuracy of the etching and deposition process and enables more precise control over the system. Overall, YES R 1 etcher/asher is an efficient and Innovative tool for the electronics and semiconductor industries. It can be used to create multi-level etching and deposition processes with precision and accuracy.
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