Used YES / GLEN R3 #9193375 for sale

YES / GLEN R3 is a high-precision asher or etcher that is used for nanofabrication. It provides excellent uniformity of the parameters during etching and it is designed for use in both the dry and wet etching techniques. Its versatile design allows for a variety of process parameters to be set accurately and quickly for high-precision etching. The equipment itself is composed of several units, including a plasma controller, a power supply, an aether system, a lift table, and a control console. Its unique aether unit uses a low pressure, low current, and low temperature ionized gas mixture that is fed into the processing chamber through multiple injectors, allowing for uniform etching of the substrates. The plasma controller is designed to provide minimum sputtering on the sample and accurate control of ionization, allowing for precise adjustments of the etching parameters. The power supply allows for accurate control of the current and voltage, and is capable of providing stable signal to the process. The lift table is used to position the sample during etching and is able to raise or lower the substrate to the correct location for etching. By using the adjustable table, substrates of varying thicknesses and compositions can be etched with precision. The control console is used to set and monitor the etching process parameters. It allows you to change the amount of time allocated for etching the sample, the selectivity of the etching process, the temperature of the etching chamber, and other parameters. In comparison to other types of nanofabrication etching systems, YES R 3 is renowned for its low temperature and low pressure operation, as well as for its accuracy in controlling and monitoring the etching process. Moreover, it is a highly reliable and long-lasting machine that requires little maintenance and allows for a wide range of possible application scenarios.