Used YOKOGAWA Rainbow 4720 #293643500 for sale

YOKOGAWA Rainbow 4720 is a flexible and versatile dry etcher/asher designed for advanced processes, achieving higher throughput and yield in the fabrication of next-generation semiconductor devices. This high-performance etcher/asher equipment has a maximum etched/ashed area of 12.7 cm and a maximum substrate size of 8 inches. The extremely low-cost aspect of maintenance allows for a more efficient and cost-effective etching operation. Rainbow 4720 is a plasma etcher/asher that offers applications for a wide range of materials such as Si, GaAs, SiC, and SiGe. It also allows for high-throughput processes, such as low-temperature anneals and rapid hybrid bonding. With its high-speed carbon dioxide (CO2) gas flow, YOKOGAWA Rainbow 4720 provides high etching rates, enabling processing of a variety of materials in a very short time frame. Rainbow 4720 is capable of achieving a high level of process uniformity across the substrate, even with limited chamber area. It also features variable control of etching parameters such as gas flow, RF power, and working pressure to achieve high resolution etching operations. Moreover, YOKOGAWA Rainbow 4720 has traceable etching records and repeatable process results, allowing for a high level of process control and reproducibility. Rainbow 4720 has a sophisticated advanced database management system for process control and tracking. This allows for efficient parallel processing and quick monitoring of in-process data. All data can be viewd from a single user interface and the data can easily be shared with other users in a secure environment. The etcher/asher also has a number of safety features to prevent any accidents, such as auto-shutdown in case of gas leak, gas flow, and pressure errors. In addition, YOKOGAWA Rainbow 4720's internal unit can send alerts if process parameters are reaching critical levels. Rainbow 4720 is an advanced and reliable etcher/asher machine that is easily upgradable to cater to newer process requirements. It is specifically designed to meet the needs of the most advanced processes in order to facilitate fabrication of high-performance semiconductor devices. With its high process uniformity and flexibility, it is the ideal solution for applications in the semiconductor industry.