Used OERLIKON / LEYBOLD 450B #9254671 for sale

Manufacturer
OERLIKON / LEYBOLD
Model
450B
ID: 9254671
Vintage: 2009
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OERLIKON / LEYBOLD 450B is an evaporator used to produce high-temperature, precision thin films for applications such as semiconductors and optical coatings. It utilizes a low-pressure evaporation process that allows for the deposition of organic, inorganic, and polymer thin films in thicknesses ranging from monomolecular up to several microns. The heater assembly in the evaporator uses four heating zones that can be individually adjusted, allowing for versatile and precise temperature control and gradual temperature changes. The heating zones each contain high-precision, rapid-response ceramic heaters. The power supply is designed to provide precise and stable power for both rapid heating and cooling cycles. The evaporator uses a water-coolable chamber for increased efficiency and improved process control. The starting material can be in the form of pellets, granules, or solid-state sources. The material is then loaded into the high-vacuum chamber. The water-coolable sample boat helps to keep the material at a temperature below the vaporization point. The sample material is then vaporized by applying a pressure differential between the crucible evaporator and the side exhaust port. The material then enters the process chamber through the precursor and is mixed with the reactive gasses. The material is then deposited onto the substrate, resulting in a thin film. The control system for LEYBOLD 450B is designed for easy and precise control of the deposition process. It features an intuitive graphical user interface with advanced capability for the selection and monitoring of operating parameters such as deposition time, film thickness, spatial uniformity, as well as total pressure monitoring. Additionally, there are customizable user-defined automatic recipes that can be stored and recalled for future runs. OERLIKON 450B evaporator is an ideal solution for the production of high-quality thin films with improved process performance, increased process reliability, and flexible user control. It is an ideal choice for applications involving the deposition of thin films and can produce superior results for a wide range of materials.
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