Used ULVAC LIS #9078392 for sale
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ULVAC LIS is an evaporator manufactured by ULVAC, Inc., a company that specializes in vacuum technology. It is a low-vacuum evaporator that is used primarily in the semiconductor and optoelectronic industries. The evaporator is designed to provide rapid and uniform evaporation of thin-film materials with impressive precision and repeatability. LIS is constructed of a combination of ceramic and stainless steel materials, giving it a lightweight yet durable construction. It consists of an atomizer unit, a vacuum chamber, and a substrate chuck. The atomizer unit contains an RF induced antenna, helium and/or nitrogen gas, and a shutter system that can control the speed and duration of the evaporation. The vacuum chamber is made of stainless steel and contains a ceramic chamber liner. The substrate chuck holds the substrate and can be adjusted to ensure uniform evaporation of the thin-film layer. ULVAC LIS has a vacuum level of 10-5torr and a temperature range of 0-500°C. It is a fast-acting evaporator and can evaporate up to 1nm of material in seconds, which makes it ideal for the high-volume needs of the semiconductor industry. Additionally, its precise positioning of the RF source ensures uniform evaporation over the entire substrate. LIS is easily operable and requires minimal maintenance. It is equipped with an on-board computer that contains detailed operating and safety instructions. Additionally, it has safety features such as overpressure protection and warning alarms. The evaporator also has a modular design that allows it to be easily disassembled for quick service or replacement of parts. ULVAC LIS provides consistent substrate coverage and is well-suited for a variety of thin-film processes, including oxide film deposition, resistive film deposition, thinning of deposited films, and advanced wafer integration. Its uniformity of evaporation makes it ideal for precision thin-film applications such as integrated circuit production. In addition, its speed and temperature regulation make it an ideal evaporator for processes that require rapid and uniform evaporation.
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