Used ADTEC Adex-3000S #9363513 for sale

ADTEC Adex-3000S Exposure Equipment is an advanced wafer-level maskless workflow tool with state of the art features. Adex-3000S offers extended resolution, patterning performance, and resolution range of up to 15 microns to support a wide range of different semiconductor/MEMS designs. The system is equipped with three quartz lamp concave mirrors and its multi-lamp array design ensures a uniform illumination level across substrate sizes up to 8 inches. It also supports exposure to various types of photoresist films, positive and negative photosensitive materials. ADTEC Adex-3000S also features an advanced real-time modulation control unit, which enables high precision, fine patterning down to 1.3 nm resolution and in high contrast to the nearby exposure spots. This fine-grain accuracy enables tighter lithography design parameters at the feature level with improved linearity. This real-time adjustment machine also enables high-speed and high-resolution multi-pattern exposures with optimized focus inputs to enable higher throughput. This exposure tool uses a novel design approach utilizing a high throughput air/gas convection plate to level out the exposure field. This allows for highly uniform exposure across the surface. Additionally, Adex-3000S uses a self-calibration asset that can detect and compensate for laser power fluctuations to eliminate masking errors and distortion during exposure. ADTEC Adex-3000S Exposure Model offers fast and reliable imaging capabilities because of its plasma wave lithography capabilities. This capabilities enable extremely high-speed exposures to be achieved and image distortions to be greatly minimized. Enhanced resolution is also possible through an advanced laser energy pulse control equipment that adjusts and shapes laser energy output. Adex-3000S supports batch production and rapid prototyping of advanced designs without the need of dedicated mask blocks. This significantly reduces production costs as specialized masks are no longer required, leading to reduced costs for mass production. Additionally this enables quick turnaround prototype and validation projects. The system eliminates bottle-necks encountered in conventional mask production and wafer processing. ADTEC Adex-3000S Exposure Unit offers a unique combination of features which enable faster quality design with greater flexibility. With its multi-lamp array, plasma wave lithography, and self-calibration machine, it offers users a level of performance and accuracy superior to conventional mask patterning.