Used ADTEC Anex-A2161 #9383880 for sale

ADTEC Anex-A2161 is a powerful state-of-the-art exposure equipment designed for photolithographic research and development. It is well suited for aligning, projecting and exposing substrates in different kinds of application fields. Anex-A2161 features several unique features that make it well adapted to the demands of photolithographic research and development. It includes a high-resolution ruby-laser projection system along with a wide-range camera with a high-quality CCD sensor. This allows precise alignment with regards to the design patterns on the substrate. It also utilizes a high-precision glass mask stage that enables direct visual alignment with the mask design. ADTEC Anex-A2161 has an advanced image-processing unit for measuring, processing and projecting a photomask design on a substrate. This can be done with a precise preset magnification and rotation, allowing precise adjustments of individual points in the design. Additionally, the machine can be used for a variety of applications such as direct laser writing and projection-assisted optical imaging. The exposure tool also contains a three-dimensional target positioning asset, allowing for precise targeting and movement of the substrate or mask. This offers high accuracy when projecting the mask design onto the substrate. The exposure model also includes a light-measuring equipment, which provides accurate exposure results when determining the resistance to the exposure. Anex-A2161 is a powerful, user-friendly and precise photolithographic exposure system. Its combination of features make it an ideal choice for research and development applications, offering precision and accuracy with maximum flexibility. With its advanced and precise image-processing unit, it provides an efficient and effective way of exposing substrates with a variety of photomask designs, while its three-dimensional target positioning machine provides precise targeting and movement. The light-measuring tool also provides accurate and reliable results when determining the resistance to the exposure.