Used ADTEC Bex-250S-W #9384307 for sale

ADTEC Bex-250S-W is a full-automatic, high-precision exposure equipment designed for precise pattern transfer in the production of integrated circuits. It is capable of producing fine, high-quality patterns on wafers up to 8 inches in diameter. The system is equipped with a 250W laser source which is capable of achieving exposure energy levels from 0.5 to 50mJ. The laser source features a wide spectrophotometric range and is capable of stable performance with high accuracy. The unit is also equipped with a high accuracy beam-orientation machine, which allows precise alignment of the beam with the wafer. Bex-250S-W is capable of supporting a variety of exposure formats such as rectilinear, circle, and line patterns. It also supports multi-level exposure and multi-exposure patterns. The tool is also equipped with a wide range of functions that are designed to minimize development time and effort, including support for pattern-edge smoothness optimization, defect inspection, edge-overlap correction, and quality control. In addition to the laser source and beam-orientation asset, the model is also equipped with a vacuum autoloader that safely and reliably transports wafers between the foreign object detector, laser exposure, and unloading chambers. This allows the equipment to accurately and efficiently process wafers sequentially. ADTEC Bex-250S-W is designed to be extremely user-friendly with its intuitive user interface. The user can easily program steps such as exposure parameters, pattern edge optimization, and sequence optimization. The system also features an alarm unit that warns the user of any potential issues and allows the user to make adjustments or modifications quickly and easily. Bex-250S-W is ideal for use in the production of both single and multiple-layer integrated circuits. Its high accuracy and precision make it an invaluable tool in the production of high-quality integrated circuits.