Used ARGUS INTERNATIONAL 7725 #9020940 for sale

ARGUS INTERNATIONAL 7725 is a sophisticated exposure equipment that is used for a variety of applications, such as lithography, photomask and direct-write electron-beam lithography, wafer testing, and other applications. It is designed to offer optimal performance for a wide range of applications by providing a combination of high-precision wafer registration, versatile exposure control and accurate beam positioning. The ARGUS 7725 includes a widefield, fly-by scanning electron beam for improved accuracy and throughput, making it ideal for lithography. The system is equipped with four large capacity load locks, enabling users to transfer multiple wafers at once, allowing greater productivity. It also features a high-resolution charge coupled device (CCD) camera for wafer surface imaging and optimization. This allows for sensitive alignment and profile measurements with a high degree of accuracy. The unit also provides a highly accurate electro-optical machine for simultaneous acquisition of optical and electron images to help ensure the most precise patterning. In addition, it features a broad range of measurement algorithms for both lithography and direct-write operations, allowing for accurate overlay and dose control. The ARGUS ARGUS INTERNATIONAL 7725 offers a unique temperature and humidity control for improved process stability. It also allows for reliable results when using substrates and resists that require Atmospheric, Relative Humidity (ARH) permits. This is done with an integrated environmental control tool that limits temperature and humidity levels. The ARGUS 7725 is equipped with multiple wafer ports for convenient loading and unloading of the substrates. It also has extensive networking capabilities and intuitive, user-friendly software that allow users to monitor the asset from a remote location. This allows for better communication with the machines and seamless integration into the company's shared databases. In conclusion, the ARGUS ARGUS INTERNATIONAL 7725 is an advanced exposure model capable of accurately and quickly providing critical patterning and dose control. Featuring several unique features, such as its high-precision measurement algorithms and environmental control, the ARGUS 7725 offers reliable, long-term performance and unbeatable processing results.