Used AXCELIS / FUSION 150PC #84749 for sale

AXCELIS / FUSION 150PC is a state-of-the-art high-performance wafer and mask exposure equipment designed to meet the stringent demands of advanced photolithography processing. FUSION 150PC features a two-in-one architecture design, a fully integrated optical column with two independent wafer and mask stages. This unique two-in-one architecture enables simultaneous exposure of a wafer and a mask, making it the perfect choice for meeting the stringent demands for increased throughput in advanced lithography processing. The system utilizes a powerful programmable laser drive and an integrated mask and wafer reticle stage to ensure precise alignment of the reticle and wafer. The unit also features an advanced optics package and a full suite of imaging options ranging from optical microscope to UV and SEM inspection systems. AXCELIS 150 PC includes a comprehensive range of processing tools and features, including optical path correction, image enhancement, and fully programmable automated alignment and measurement tools. A built-in calibration and verification suite ensures consistent and repeatable results. The machine comes with a revolutionary new control procedure for improved accuracy and throughput, allowing the user to control dose, timing, focus, and other critical parameters with ease and quickly. FUSION 150 PC is capable of reaching a maximum resolution of 1.5x the conventional I-line tool, so it can achieve ultra-fine circuit features, while at the same time reducing costs. The asset is also equipped with advanced diagnostic tools that enable non-destructive laser power testing, providing an accurate, reproducible measurement of each reticle and wafer being exposed. For areas requiring consistency, the model is designed with an advanced overlap patterning algorithm which allows matching wafer-to-reticle exposures with minimal user effort and intervention. AXCELIS 150PC is a top-of-the-line equipment with robust and reliable design, ideal for achieving the highest levels of throughput and accuracy in the advanced lithography process. Its combination of innovative features and advanced control system makes it an excellent choice for any semiconductor fabrication facility.