Used AXCELIS / FUSION 200 ACU #9399207 for sale

AXCELIS / FUSION 200 ACU is an automated exposure equipment designed for exposing patterned silicon wafers to ultraviolet light. The system uses advanced technologies such as laser diode arrays, pattern recognition optics, positional sensors and computer controlled motion systems to precisely expose wafers to a variety of applications. FUSION 200 ACU features a high-efficiency laser diode array that is capable of emitting ultraviolet light at up to 1000 watts, resulting in a higher throughput than conventional exposure systems. The laser diode array is based on advanced optics technology and is self-calibrating, allowing for higher accuracies and repeated exposure patterns within a single wafer. This unit is also capable of recessing into polygons, circles, ellipses, rectangles and hexagons, as well as periodic and non-periodic patterns or grids. The automatic pattern recognition and precision optics of AXCELIS 200ACU allow for Exposure-Zone-Quality (EZQ) analysis to occur on a wafer, with the ability to precisely recognize and accurately expose patterned wafers in a single pass. The machine also features a built-in endpoint detection method to accurately detect when the wafer has been fully exposed. In addition, 200ACU employs advanced motion systems that serve to precisely move the wafer under the laser diode array and between exposure runs, accurately validating the position of the pattern on the wafer through positional sensors. This ensures that the patterns are accurately exposed, regardless of the pattern size, orientation or complexity. This automated and precise exposure tool is capable of accommodating a variety of wafers, including 3-inch, 5-inch, 8-inch and 12-inch wafers, and is user-friendly, offering users the flexibility to fine-tune the asset to meet their specific process needs. With its robust and reliable design, 200 ACU is an excellent choice for any production process involving patterned silicon wafers.