Used AXCELIS / FUSION 200 PCU #9016214 for sale

AXCELIS / FUSION 200 PCU equipment is a powerful exposure system that provides cutting-edge lithographic processes and capabilities. It offers a wide range of capabilities, allowing users to accurately pattern a variety of substrates in a variety of different formats. FUSION 200 PCU exposure unit operates using deep-ultraviolet (DUV) exposure source, coupled with an advanced Target Renovation Retarder (TRR) and leading-edge optics. The robust air-bearing machine helps ensure accurate and repeatable movement, enabling precise overlay and pattern placement. Additionally, AXCELIS 200PCU includes a state-of-the-art, low-stress wafer revamping tool and an in-situ optical monitoring asset, allowing for near-real-time data monitoring. This reduces exposure time, providing higher yields and yield improvement. FUSION 200PCU has the capability of performing a variety of image-uniforming operations, such as etchback and variable-shaped exposure, resulting in outstanding yields and improved feature accuracy. Furthermore, the model offers industry-leading overlay accuracy, allowing multiple exposure grids to be patterned in one task step. The included auto-alignment tool is compatible with a variety of image formats, making setup and execution easier than ever. In terms of its resist-processing capabilities, AXCELIS / FUSION 200PCU supports mid- and high-etch selectivity, enabling users to expose pitches to approximately 0.6 microns. The equipment also includes advanced resist evaluation functions that provide accurate characterization of photoresist properties. AXCELIS 200 PCU system is compatible with most popular CAD programs and process platforms, making it easy to integrate into existing setups and provide users with increased productivity and operational flexibility. Additionally, the unit can be fitted with a variety of accessories, such as sensors and optics, allowing for further customization based on needs. Overall, 200 PCU is a powerful and efficient exposure machine with a wide range of capabilities and features that enable users to achieve outstanding yields and improved feature accuracy. It is suitable for a variety of substrate and layer types, making it an excellent lithographic solution for a range of applications.