Used AXCELIS / FUSION 200 PCU #9123076 for sale

AXCELIS / FUSION 200 PCU is a high-precision exposure equipment designed for lithography and semiconductor fabrication. It offers enhanced accuracy and throughput rates, as well as improved reliability and performance. The system provides 200 W of maximum source power and features a wide range of wavelengths, including EUV, F2, KrF, ArF, and i-line sources. The unit is composed of a Precision Photolithography Module (PPML) coupled with a Beam Scanning Machine (BSS). The PMML consists of an X-Ray Source, Mask Aligner, Illumination Assembly, and Data Acquisition Tool. The X-Ray Source is a thermionic type discharge atomic source that delivers high-energy electrons to heat a target. This target converts x-ray radiation into ultraviolet, visible, or infrared radiation. The Mask Aligner allows accurate positioning of the mask in the x-ray beam. Its motorized five-axis stage offers the flexibility to adjust the mask position in five degrees of freedom. The Illumination Assembly contains optical components, including lenses, mirrors, and filters, which shape the beam pattern, reduce thermal distortion and control energy distribution. The Data Acquisition Asset collects and stores exposure data directly from the image sensor. The Beam Scanning Model (BSS) simultaneously processes 200 wafers per run, providing wide exposure customization. For example, users can customize laser pulse duration, scan shape and speed, and dosage with high accuracy. The BSS also offers an optional Vacuum Based Pre-scanner (VPS) for wafer pre-alignment and improved measurement throughput. The VPS is integrated with a laser pattern recognition algorithm that identifies fiducial marks on the wafer before exposure and automatically corrects for any deviations from specifications. FUSION 200 PCU combines advanced precision alignment with superior scan accuracy for improved lithography performance. The equipment makes rapid, accurate, and reliable exposure of complex and delicate layouts possible, making it an ideal tool for critical lithography applications.