Used AXCELIS / FUSION 200 PCU #9231979 for sale

AXCELIS / FUSION 200 PCU (Photonic Collimated Uniformity) is an advanced exposure equipment that provides high-precision photolithography capabilities. With highly customizable and automated features and user-friendly software, FUSION 200 PCU enables fast, efficient, and accurate alignment, exposure, and processing of a wide range of semiconductor and photomask materials. This system employs a two-stage patterning and alignment unit, featuring both uniform mask, and aberration-free illumination capabilities. The first stage is the projection aligner, which uses the combination of the Image Alignment Tool (IAT) and the Precise Alignment Tool (PAT) to achieve precision alignment of the photomasks to within 5 nanometers in both x and y dimensions. The second stage is the exposure tool, which uses the Application Aligned Uniform Projection (AUP) to uniformly expose the photomask material. AXCELIS 200PCU also uses the patented AQUA (Advanced Quasi-phase-Shift Mask) technology to ensure uniform intensity levels during process-critical lithography steps. This helps to guarantee the full-sized, high yield, process-stabilizing photoresist coverage on any photomask material. AXCELIS 200 PCU features four advanced alignment and exposure modes, allowing users to adapt to specialized photomask materials and lithography processes. These include: E-RASTER mode, which enables automated e-beam writing, Standard mode, and Static mode. Additionally, this machine also has a "Fast Mode," which is designed for maximum throughput and faster than industry-standard cycle times for photomasks of 0.5 to 12.5um in size. For imaging and optical control, 200 PCU uses an optics package that utilizes an active, digital telecentric light source, which offers users greater flexibility, stability, and accuracy. This tool is also equipped with a high-resolution pattern recognition asset that is capable of locating the most difficult masking patterns. Additionally, FUSION 200PCU can be used in both vertical and horizontal configurations. Finally, 200PCU offers three advanced post-exposure processing functions to ensure accurate, reliable processing outcomes. These include: substrate cleaning, loading/unloading, and edge trimming. All of these functions are fully automated and can be used simultaneously, meaning that photomasks can be processed quickly and with little operator intervention. AXCELIS / FUSION 200PCU is an advanced exposure model that offers a high level of precision, accuracy, and flexibility for semiconductor and photomask fabrication. With its powerful features, users can achieve fast cycle times, highly precise alignment and exposure, and precise post-processing for high quality results.