Used AXCELIS / FUSION 200 #9190886 for sale

AXCELIS / FUSION 200 is an advanced semiconductor exposure equipment used in the fabrication of integrated circuits. This system features a scanner-like subsystem, capable of greater than 1µm precision and repeatability and provides an integrated solution for everything from rapid prototyping to high-volume production. The unit is based on a dual-column environment and has a large area of coverage with a wide range of process parameters. It is a powerful tool for high-end lithography, allowing for improved scalability and throughput compared to other solutions. FUSION 200 features an intuitive, user-friendly interface with a complete suite of advanced optical and computational technologies. This machine uses state-of-the-art optics and mechanical components to provide fast, precise, and consistent exposure across the entire chip. Several illumination modes are available, such as a standard mode and a proximity mode. Additionally, AXCELIS 200 is an to be used with ultra-violet and deep ultra-violet light sources to effectively process a variety of materials. The tool is capable of handling all types of substrates, including wafers up to 200mm and flat panels up to 12-inch. Additionally, it features a variety of performance options, such as exposure time, energy levels, and other settings, that can be adjusted depending on the application. Furthermore, 200 comes with an integrated simulation asset, allowing it to quickly replicate the desired exposure parameters. This helps to improve the lithography process and ensure a high level of uniformity and repeatability. The model is designed to minimize the cost of maintenance and operation. AXCELIS / FUSION 200 requires minimal maintenance and has a significantly extended lamp life, lowering overall operating costs. In addition, the equipment is compatible with a wide array of substrate materials and features superior alignment and resolution. This makes it a great option for high-volume production. FUSION 200 is a reliable, high-performance exposure system suitable for all types of semiconductor applications. Its superior optics and accurate alignments allow for highly precise processing of a range of materials. Furthermore, it is easy to use, has low maintenance needs, and provides time- and cost-saving options.