Used AXCELIS / FUSION DRS-10 / 12QN #293645766 for sale

AXCELIS / FUSION DRS-10 / 12QN is a state-of-the-art exposure equipment developed to enable a wide range of photolithography applications. This system is built upon a uniquely integrated platform of lithography and optical components, featuring a broad set of process enabling technologies. FUSION DRS-10 / 12QN combines the latest advances in optics and motion control, providing superior performance and flexibility for unique double-sided wafer exposure. The unit includes a gantry-mounted scan machine to accommodate various wafer sizes and substrates. An actable quartz cloak assembly provides uniform scanning process performance, as well as improved lifecycle performance. The highly repeatable, low-noise scan tool, coupled with a quartz-protected photo adjustment stage, and a self-aligning post exposure stage, enable precise positioning and registration. The 10nm process capable laser interferometer ensures the accuracy of this registration by monitoring the scan chain positioning before and during the exposure. The systems high-precision laser scanner and pattern generator systems allow for pattern fidelity with precise temperature control and excellent uniformity across the entire wafer. The high throughput of the asset is achieved by a combination of fast servo response, precise control, and sophisticated software algorithms. The model features an automated optical alignment equipment, which utilizes two auto interferometers for precise alignment that is highly repeatable across wafer sizes. AXCELIS DRS-10 / 12QN uses a superior shutter-door thermal isolation system that ensures precise temperature control and repeatability of parameters. The unit also has a range of optional components, from remote chuck monitoring to advanced soft watcher/recipe development systems. The powerful software enables its users to design a wide range of complex optical configurations. In summary, DRS-10 / 12QN provides state-of-the-art double-sided wafer exposure performance. Its range of advanced features and components offer unmatched operational flexibility and high throughput. Its integrated software packages and process-enabling tools make it a great choice for any photolithography application.