Used AXCELIS / FUSION F 300S #9309256 for sale

AXCELIS / FUSION F 300S exposure equipment is an advanced tool used in the manufacture of semiconductor devices. It is an advanced system that employs advanced optical components, allowing users to achieve highly-precise exposure of materials with sub-micrometer resolution. The unit is made up of several key components, including a projector, scanning unit and multiple light sources, allowing users to create a wide range of exposure patterning. The machine is compatible with a variety of semiconductor device types, making it a highly versatile tool for manufacturers. The projector is at the heart of the tool, providing exposure light of up to 5kHz. The projector contains an automated, variable-aperture asset, allowing users to precisely adjust the size of the exposure light, enabling exposure of small feature sizes. The projector also utilizes advanced Pulse Width Modulation (PWM) technology to accurately control the exposure of spots onto the target - allowing users to achieve feature size resolutions down to 0.25 micron. The scanning unit of the model allows for extremely precise exposure moves over complex shapes within the target. It is responsible for controlling the movement of the exposed illumination within the field of view, allowing for very accurate placement of the exposure light. The scanning unit also contains a Pico Speed Controller, allowing for rapid, highly-accurate exposure moves, enabling exposure of small features across a wide range of chip designs. Additionally, FUSION F 300S is capable of mixing light from multiple exposure sources. This feature allows users to precisely adjust exposure parameters such as exposure depth and exposure rate, as well as the ability to swap out and adjust exposure lights on the fly. In conclusion, AXCELIS F 300S exposure equipment is an incredibly advanced tool used in the manufacture of semiconductor devices. Its advanced optics and sophisticated components enable users to achieve sub-micrometer resolution, with exposure rates of up to 5kHz. Additionally, its ability to mix light from multiple sources allows users to quickly and precisely adjust exposure parameters in order to create complex exposure patterns.