Used AXCELIS / FUSION I250B #9411422 for sale

AXCELIS / FUSION I250B is an exposure equipment designed for photolithography processing of memory devices and ICs. It offers reliable, repeatable and repeatable exposure with high resolution and throughput. It has a modular design which allows it to easily adapt to different process requirements. FUSION I250B uses a host of advanced technologies to achieve its impressive results. The system uses two different wavelengths of light in its exposure procedure, thus providing superior imaging and resolution capabilities. The light source is a powerful Laser Diode Array (LDA) which produces up to 900 mW of laser power and is capable of wavelengths from the UV to the visible range. A dichroic mirror is used to switch the laser power between the two light sources. This unit also utilizes a global shutter that minimizes blur during the exposure. The machine features various features for precise control of the exposure process. It offers an adjustable laser power up to 500 mW, and adjustable line speeds from 0.5 to 1.5 lines/sec. The exposure time is adjustable from 1ms to 1000 ms to fine-tune the repeatability of the process. Its global shutter prevents motion blurring and provides smooth coverage and high yields in patterned devices. AXCELIS I250B features various features for wafer illumination, such as dynamic focus and an adjustable back plane-image intensity level. This tool also uses a motorized wafer transport asset with two-axis movement. This results in greater throughput as well as reliable wafer alignment and repeatability. I250B is designed to be used with a range of chemicals and materials, such as dry and wet resist, photoresist, etch, resist strip, electroless plating and anti-reflection materials. It provides excellent uniformity, resolution and coverage, both across and around the wafer. Overall, AXCELIS / FUSION I250B is an advanced exposure model designed for precision and reliability. Its modular design and features offer excellent throughput, resolution and reliable repeatability. With its impressive performance, this equipment is perfect for memory devices and ICs photolithography processing.