Used AXCELIS / FUSION K250 #9411431 for sale

AXCELIS / FUSION K250 is an exposure equipment designed specifically for processing optoelectronic applications on semiconductor wafers. The system offers best-in-class performance to deliver greater wafer throughput and excellent process control. The exposure unit is designed to provide ultra-precise process control and high throughput for a wide variety of applications in optoelectronic production. It features an advanced variable-source wafer handling station to provide high power efficiency and consistent exposure. The machine includes a 270-micron UV beam source with advanced optical components for exposure of patterned areas on the wafer at high accuracy, and an integrated pre-aligner and scanner to achieve optically precise alignment of the exposure. FUSION K250 provides superior wafer throughput thanks to its high current ion beam source and up to 700 W acceleration voltage. Additionally, its advanced by-product containment tool ensures superior environmental protection for cleanroom operations. The asset also features an advanced manipulation capability for wafer loading and unloading, as well as for wafer/mask alignment. An ergonomic user interface provides real-time feedback, an intuitive graphical interface and a simplified procedure to operate the model. Additionally, the equipment's advanced control capabilities ensure optimum exposure parameters and process stability. AXCELIS K250 is the ideal solution for optoelectronic production requirements. It offers superior process control, high throughput and advanced manipulation capabilities for a wide range of optoelectronic processing applications. Its highly performing wafer handling station, along with its advanced technology and user-friendly interface, make it the ultimate exposure solution for optoelectronic production.