Used AXCELIS / FUSION K250 #9411432 for sale

AXCELIS / FUSION K250 is an advanced exposure equipment designed for the semiconductor industry. It features a 250 watt high-resolution laser, precise and repeatable motion control, and an air bearing stage for high-precision wafer position control. The system is capable of producing precise line patterns and patterns up to one micron in size. FUSION K250 is capable of providing high-resolution and precise lithographic images on a variety of substrates including bare or coated wafers, PCBs, and hybrid circuit devices. The unit features a compact design that provides the user with a large work envelope for ease of alignment and processing. The 250 watt laser provides a bright illumination source for highest quality imaging. The motion control of AXCELIS K250 is highly precise, repeatable, and is capable of producing line patterns and patterns up to 1 micron in size. The machine offers variable speed control to ensure accurate and repeatable exposures. The low speed resolution is 100 nanometers while the high speed resolution is 45 microns. This makes it possible to produce even the most intricate patterns, with excellent accuracy. K250's air bearing stage provides superior wafer positioning accuracy and repeatability, enabling precise and accurate patterning operations. The tool uses a unique dual stage design which allows for optimized performance for different subsequent process steps, thus allowing maximum efficiency. The XY stage of AXCELIS / FUSION K250 is highly precise, providing a maximum velocity of 400 mm/s in all directions. The stage is temperature-controlled, which provides stable and consistent imaging results over long exposures and high-temperature environments. Additionally, the asset supports multiple patterning layers and automated alignment of patterns. In conclusion, FUSION K250 is an advanced exposure model designed for the semiconductor industry. It comes with a 250 watt high-resolution laser, precise and repeatable motion control, and an air bearing stage for high-precision wafer position control. The equipment is capable of producing precise line patterns and patterns up to one micron in size. It is an ideal solution for manufacturers looking for a high-quality, reliable, and efficient imaging system.