Used AXCELIS / FUSION K250 #9411433 for sale

AXCELIS / FUSION K250 is an exposure equipment designed specifically for processing of IC wafers. The system utilizes a proprietary stepper motor unit and optics to deliver a high resolution exposure as small as 0.45 µm. Additionally, the stepper motor is capable of high accuracy alignment, achieving a positional accuracy of 1.5 µm. The machine has a modular design, making it easy to upgrade and customize for various applications. As such, it is a reliable tool for the advanced processing of IC wafers. FUSION K250 has a wafer rotation stage with a 4" (100mm) air bearing plate, offering a scan area from 5.5mm x 5.5mm to 9.5mm x 9.5mm. The wafer stage also features a patented vertical alignment mechanism, ensuring accuracy and longevity. It also has a unique "air-fencing" tool that helps control the stepper motor and optics, providing stability for the exposure process. The exposure asset is fitted with high performance FUSION optics, which boasts a field size of 44μm x 33μm, exposure time of 0.2 sec, exposure dosage of up to 10W/cm2, superior particle reduction filter and other features. The optical configuration also promotes increased throughput, making it an ideal tool for production operations. AXCELIS K250 is designed to be as user friendly as possible. It allows for batch and single-port recipe loading, with an intuitive menu model that enables ease of use. Furthermore, a library of over 100 exposure recipes is provided, making it easy to store and retrieve settings. The equipment has two base process gases, oxygen and nitrogen, which are used in the user-defined recipes to prevent photomask contamination. Additionally, the system is equipped with an advanced moisture removal unit, ensuring the dryness of the exposed wafer surface. In addition to industry leading technology, K250 offers excellent technical support. Expert engineers are on-call 24/7 and can be reached via telephone, email, or through the company website. Overall, AXCELIS / FUSION K250 exposure machine is a state-of-the-art tool for IC wafer processing. It features fast exposure times, high resolution imaging, superior hardware and optics and excellent support. As such, it is the perfect choice for IC production operations.