Used AXCELIS / FUSION M 150 #193148 for sale

AXCELIS / FUSION M 150 is a multi-direction exposure equipment designed to support multiple die sizes in a fast and reliable manner. This system provides wafer planes from various types of substrates such as quartz, metals, and plastics. The unit features an extraordinary two-axis motion machine which allows for rapid, precise alignment of the substrate. Through a combination of X-Y motion and rotary motion, the tool offers a flexible solution for multi-die wafer applications. FUSION M 150 asset utilizes a powerful modular architecture that provides advanced control over the exposure process. It is powered by two Step-Motor linear servomotors and feature an advanced programmable vector drive that can effectively handle high-speed substrate motion. Its unique design provides maximum control and flexibility for the desired exposure process and is fully configurable to suit the requirements of each substrate. The model is also equipped with a patented variable pressure equipment providing the ultimate solution for managing the desired exposure uniformity. With its adjustable pressure, the system can maintain optimum pressure levels while eliminating the effects of substrate warpage. The unit also features a dual-zone control machine which independently controls pressure both on the top and bottom surfaces of the substrate. AXCELIS M150 is also equipped with an advanced die mapping tool that provides operators with a complete meta-data summary of the entire image or die across all the substrate faces. This helps to ensure both accuracy and consistency in the exposure process. The asset is also capable of achieving a wide range of exposure angles. Its high-performance optics selection allows for exposure at angles ranging from 0° to 60° enabling it to achieve greater contrast and resolution. This makes it suitable for the fabrication of various interconnects and other circuit elements. AXCELIS / FUSION M150 is fully customizable to meet the individual needs of the customer and provide superior performance. It is an ideal choice for any substrate surfaces with a variety of design requirements. Its ability to accurately and consistently meet the needs of demanding applications makes it the perfect multi-direction exposure model for any application.