Used AXCELIS / FUSION M 150 #9293753 for sale

AXCELIS / FUSION M 150 is an advanced exposure equipment designed for high throughput and large substrates. It is capable of providing high resolution, low distortion, uniformity, and low defectivity for a wide variety of applications from ultra-high precision semiconductor mask formation to large-area flat panel displays. FUSION M 150 is equipped with an advanced electron beam source, allowing for a wide range of stage sizes (from 300mm to 1200mm) and substrate configurations, with an industry-leading flight time of 150 ns. The electron beam source delivers an extremely stable, repeatable performance at an ultra-low power range, making it ideal for applications that require finer line and contact geometries. The system is highly customizable and configurable, allowing users to choose the best configuration and setup to meet the needs of their applications. Additionally, the flexibility of the unit allows the user to choose from a variety of control applications, including automated feature recognition, simulation, and optimization. AXCELIS M150 is capable of supporting a variety of wafer materials and photomasks, including large aperture masks and high-density reticles. Furthermore, it can also support feature sizes down to 0.1 micron. The machine is equipped with advanced diagnostics capabilities which allow users to monitor the performance of their tool and optimize the process parameters. This helps to ensure superior process control and repeatable results. In addition, FUSION M150 also offers a number of other features that contribute to its dependable operation. High-speed data exchange and networking capabilities allow for easy operation and support integration with a variety of asset peripherals, such as wafer alignment software, processor optimization tools, and more. M150 is suitable for a variety of applications, from high quality advanced photomasks and contactors to unpatterned substrates for ultra-large surface areas. Additionally, its combination of advanced features and reliable performance makes it a top choice for production of both high-end semiconductor devices and large-area displays.