Used AXCELIS / FUSION M 150PC #293822595 for sale

AXCELIS / FUSION M 150PC is a state of the art exposure equipment for high quality and precision integrated circuit photolithography. It is specifically designed to meet the lithography needs of the semiconductor industry. The system consists of an Excimer Laser Beam Source, a high-precision projection optics module, a wafer stage, an integrated Front End Unit (FES), and a comprehensive process control software suite. The machine is designed to deliver the highest quality results, with a high contrast surface, fast exposure times, precision alignment and low line blur. The proprietary FES ensures repeatability, high throughput and excellent image quality. The laser beam source provides high flux density and a narrow, 5 nm bandwidth of UV radiation. This laser energy is split, with a portion of the beam used cross-wafer and a portion used for in-line alignment, providing a resolution down to 0.5 micron. The highly reliable projection optics module consists of three stacks of lenses and mirrors, providing imaging resolution and distortion correction. By combining the laser and photomask, nanopatterns or micron-scaled patterns can be produced. The wafer stage ensures precision alignment and features six-axis motion control with a high throughput wafer loader and unloader. The exceptional stability of the tool allows for excellent positional accuracy of the wafer during the exposure process. Finally, the process control software suite provides the user with a comprehensive set of features for monitoring and controlling the entire lithography process. This includes recipe handling, logging of all parameters, error detection and recovery, and reporting capabilities. The asset also supports distributed processing, allowing multiple workstations to run simultaneously. By combining laser technology, projection optics, a wafer stage and software control, FUSION M150PC provides unparalleled performance in the fabrication of integrated circuit systems. The model is designed to produce the highest quality lithographic images, in a fraction of the time and cost, allowing semiconductor manufacturers to remain competitive while keeping pace with industry demands.