Used AXCELIS / FUSION M 150PC #9232206 for sale

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ID: 9232206
System.
AXCELIS / FUSION M 150PC is an advanced exposure equipment created for advanced lithography applications. The system is equipped with a unique 5-axis stage unit that allows for precise and accurate alignment for top-level performance. The machine's power provides a broad range of options for users. The tool utilizes three different source configurations: pure argon fluoride, optical bandwidth source with 248nm wavelength and i-line source with 365nm wavelength. The argon fluoride laser offers high throughput, image fidelity and uniformity over the entire photo-pattern area, while the i-line source is the ideal choice for polyimide photosensitive films. The asset also features advanced Collimated Overlay Imaging Detection Technology, which provides direct edge alignment with increased accuracy and precision. In addition, the Collimated Overlay Imaging Detection technology allows for real-time analysis, monitoring and metrology of reticles and wafers in a single cycle. Furthermore, the advanced Power Compensation Module improves throughput, focus and critical dimensions of the resist. The model also incorporates a sophisticated computing platform, which enables direct control of parameters, such as Mask ID, Exposures, Dose and Align, among others. The computing platform also enables users to customize their own recipe settings and analyze data, eliminating the need for additional programing. The source of FUSION M150PC is intelligent enough to automatically detect when a mask, wafer or reticle are loaded in the equipment. Moreover, the system is equipped with a number of state-of-the-art safety features, such as emergency shutoff, as well as burn and electrical safety mechanisms. AXCELIS M 150 PC is a powerful and reliable exposure unit, capable of delivering top-notch performance in a variety of lithography and nanofabrication applications. Its user-friendly features and advanced features enable users to create the highest quality images and patterns with minimal effort. The machine is well-suited for both industrial and research applications, such as nanoelectronics, semiconductor, micro optics and photonics.
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