Used AXCELIS / FUSION M 200 PC #9329137 for sale

ID: 9329137
Photo stabilizer.
AXCELIS / FUSION M 200 PC is an advanced exposure equipment developed for laser lithography applications. The system uses a 532-nm green excimer laser to create photoresist patterns on semiconductor wafers. It also features two precision focusing optics to provide high-resolution imaging with improved depth of focus and higher throughput. The unit has a rigid base plate design to eliminate vibration and ensure accurate photolithography alignment and exposure. It also incorporates a thermal imaging machine and advanced metrology tools to monitor and adjust the exposure parameters during process runs. The core feature of the tool is its automated exposure capabilities. The platform allows for programmable parameter settings such as exposure times, focus depth, field size, energy levels, and wavelength. The Power SenseTM power monitoring technology dynamically measures the power distribution of the laser and automatically adjusts its properties for optimal performance. Additionally, the PulseStitchTM feature enables the user to combine multiple pulses of adjustable duration and energy into a single pulse. This ensures uniform energy distribution across the photoresist patterns. FUSION M200PC is equipped with advanced safety features to protect the operator and the laser asset from harm. In addition to the model's interlock sensors, the equipment has a built-in safety curtain system and an exhaust unit that eliminates fumes created during the exposure process. The machine also has a water-cooling tool and power supply to provide stable, sustained operation. AXCELIS M200 PC can be used in conjunction with a variety of photomask designs and can be used to develop many different types of photoresist and other photolithography processes. Its features such as precision focusing optics, programmable parameter settings, and pulsestitch technology can be combined with photomask, photoresist, and other processes to customize individual recipes making it an ideal tool for semiconductor lithography research and production.
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