Used AXCELIS / FUSION M 200 PCU #9095387 for sale

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ID: 9095387
Wafer Size: 8"
UV Cure system, 8" Shielded SECS cables Irradiator contains Hg high intensity lamp 2.45 GHz Magnetrons for UV radiation generation User-selectable: (50) Uni-cassette, (25) Uni-cassette / Cassette-to-cassette Microprocessor controlled Pneumatic controlled uplift for irradiator SEC I and II Through the wall capable UV Port housing Ergonomic loader Krein gage HW Harness and switch for right cassette platform SS Rounded wafer pans Low vacuum reduction kit PTFE Impregnated thermal chuck UV Probe kit Rear display.
AXCELIS / FUSION M 200 PCU is a complete configurable semiconductor wafer exposure equipment offering the highest-accuracy, highest-quality EUV masking for leading-edge semiconductor device technologies. Designed for 8", 12", and up to 16" wafer sizes, the system features an innovative large-size mask table with a smooth transfer motion - offering unprecedented stability and accuracy in mask writing. FUSION M200PCU is designed to accelerate mask making productivity via high-end mask throughput capability and next-generation callibration capabilities. It features four scan axes: x, y, theta, and z, for improved mask writing accuracy and stability in the presence of thermal drift. The PCU allows for fast optimization and global overlay corrections with user-selected exposure fields, as well as user-specifiable scan velocity and resolution, enabling precision overlay alignment. AXCELIS M200 PCU offers a user-friendly, intuitive graphical user interface. The integrated controller includes software tools for image-quality analysis, adaptive correction, optimization, and increased control of the unit's functions. The machine can also be integrated with an ASTA mask-inspection tool, allowing users to monitor, measure and correct all exposed mask fields with a high degree of accuracy and control. The PCU tool utilizes a high-performance laser-illumination optical asset with superior optical beam stability and power-matching capabilities. It also features a large-field, multi-slit beam delivery unit, allowing for uniform illumination over the entire mask field. The integrated dynamic beam-shaping module provides superior, sharp-edge reproduction of complex mask structure features. The optional exposure-scanner accessories can be incorporated for pattern excursions with up to 0.25um resolution. M-200 PCU is equipped with a high-precision, thermally controlled, mask and wafer stage model with a heated wafer chuck for optimized process control. The equipment also features a pulsed nitrogen cabinet to help minimize contamination, a set of high-performance mechanical stages providing high stability throughout the exposure process, and an air purification system that eliminates the potential harmful effects of dust. AXCELIS / FUSION M-200 PCU is a highly-versatile unit, capable of producing superior-quality masks with high throughput capabilities, while also providing the ultimate in accuracy, uniformity, and process control. It is truly an ideal solution for the most advanced and demanding semiconductor masking applications.
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