Used AXCELIS / FUSION PS3 #9230281 for sale

AXCELIS / FUSION PS3
ID: 9230281
Wafer Size: 12"
UV Cure system, 12" Dual chamber.
AXCELIS / FUSION PS3 is an advanced, high-performance and cost-effective exposure equipment that is used in the fabrication and manufacturing of high-tech components such as semiconductor wafers and integrated circuits. This system supports Advanced Technology Manufacturing and is built upon centuries of optics, metals and precision machine design practice to achieve cutting-edge performance. FUSION PS3 consists of a series of components including a light source, a reticle stage, a lens, camera, masking and pattern stitch. The light source, either a mercury or argon laser, emitting a wavelength range from 365 to 436 nanometers, is used to project a controlled pattern onto the reticle stage. A reticle is a mask that is used to expose a defined pattern onto the wafer. The reticle is held in a vacuum frame so that the pattern does not move relative to the substrate which is being patterned. The lens captures the light emitted from the laser and directs it towards the reticle stage. This lens is typically made of fused silica and is designed to provide a flat field of view so that the pattern is formed with precision. The camera is used to inspect the lens and reticle, while the masking unit ensures that all the process parameters are met. The pattern stitching provides a way to accurately determine the position of each pattern across the wafer. In addition to the components of AXCELIS PS 3, this machine includes a predictive controller that uses a range of sophisticated algorithms to optimize the process. This controller is constantly monitoring the performance of the tool and adjusting the parameters to ensure the best results. Additionally, the asset has a built-in safety feature that shuts down the model in the event of a process error. AXCELIS PS3 is capable of producing a wide range of patterns with high accuracy and repeatability. This equipment can be used for a wide range of applications such as lithography, etching, photolithography and plasma enhancement. Additionally, AXCELIS / FUSION PS 3 is capable of performing wafer mapping, defect inspection and dielectric testing. This system provides a range of advanced features including a high-speed pattern recognition engine and a multilevel data logger with automatic data archiving. This unit also includes a suite of software tools to control, monitor and analyze the exposing process. Overall, PS 3 is a reliable and powerful exposure machine that can be used in a variety of industries and applications. Its precision, performance and cost-effectively make it a smart choice for high-end applications that require advanced process control and accuracy.
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